Photogating-driven enhanced responsivity in a few-layered ReSe2 phototransistor
- Southern Illinois Univ., Carbondale, IL (United States)
- Southern Illinois Univ., Carbondale, IL (United States); Great Basin College, Elko, NV (United States)
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Argonne National Lab. (ANL), Argonne, IL (United States); Univ. of Chicago, IL (United States)
- Jackson State Univ., Jackson, MS (United States)
- National High Magnetic Field Lab., Tallahassee, FL (United States)
- Argonne National Lab. (ANL), Argonne, IL (United States); Jackson State Univ., Jackson, MS (United States); National High Magnetic Field Lab., Tallahassee, FL (United States)
A wide variety of two-dimensional (2D) metal dichalcogenide compounds have recently attracted much research interest due to their very high photoresponsivities (R) making them excellent candidates for optoelectronic applications. High R in 2D photoconductors is associated with trap state dynamics leading to a photogating effect, which is often manifested by a fractional power dependence (γ) of the photocurrent (Iph) at an effective illumination intensity (Peff). Furthermore, we present photoconductivity studies as a function of gate voltages, over a wide temperature range (20 K to 300 K) of field-effect transistors fabricated using thin layers of mechanically exfoliated Rhenium Diselenide (ReSe2). We obtain very high responsivities R ~ 16500 A/W and external quantum efficiency (EQE) ~ 3.2 × 106% (at 140 K, Vg = 60 V and Peff = 0.2 nW). A strong correlation between R and γ was established by investigating the dependence of these two quantities at various gate voltages and over a wide range of temperatures. Such correlations indicate the importance of trap state mediated photogating and its role in promoting high photo-responsivities in these materials. We believe such correlations can offer valuable insights for the design and development of high-performance photoactive devices using 2D materials.
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- Grant/Contract Number:
- AC02-06CH11357
- OSTI ID:
- 1839982
- Alternate ID(s):
- OSTI ID: 1812403
- Journal Information:
- Journal of Materials Chemistry C, Vol. 9, Issue 36; ISSN 2050-7526
- Publisher:
- Royal Society of ChemistryCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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