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Title: Strong effect of scandium source purity on chemical and electronic properties of epitaxial ScxAl1–xN/GaN heterostructures

Journal Article · · APL Materials
DOI:https://doi.org/10.1063/5.0054522· OSTI ID:1819746

Epitaxial multilayer heterostructures of ScxAl1–xN/GaN with Sc contents x = 0.11–0.45 are found to exhibit significant differences in structural quality, chemical impurity levels, and electronic properties depending on the starting Sc source impurity levels. A higher purity source leads to a 2–3 orders of magnitude reduction in the carbon, oxygen, and fluorine unintentional doping densities in MBE-grown ScxAl1–xN/GaN multilayers. Electrical measurements of ScxAl1–xN/n+GaN single heterostructure barriers show a 5–7 orders of magnitude reduction in the electrical leakage for films grown with a higher purity Sc source at most Sc contents. The measured chemical and electrical properties of epitaxial ScxAl1–xN highlight the importance of the starting Sc source material purity for epitaxial device applications that need these highly piezoelectric and/or ferroelectric transition-metal nitride alloys.

Research Organization:
Ames Lab., Ames, IA (United States)
Sponsoring Organization:
USDOE
Grant/Contract Number:
AC02-07CH11358
OSTI ID:
1819746
Report Number(s):
IS-J-10.587; DARPA-PA-19-04-03; DMR-1534303; DMR-1719875; NSF-MRI-1429155; DMR-1539918; DMR-1710298; NNCI-1542081; FA9550-20-1-0148; TRN: US2214572
Journal Information:
APL Materials, Vol. 9, Issue 9; ISSN 2166-532X
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English

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