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Title: Deformation of binary and boron-doped Ni3Al alloys at high pressures studied with synchrotron x-ray diffraction

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/5.0037012· OSTI ID:1812070
ORCiD logo [1]; ORCiD logo [2];  [3];  [4]; ORCiD logo [3];  [1]
  1. Florida International Univ., Miami, FL (United States). CeSMEC. Dept. of Mechanical and Materials Engineering
  2. Joint Inst. for Nuclear Research (JINR), Dubna (Russian Federation). Frank Lab. of Neutron Physics
  3. Univ. of California, Berkeley, CA (United States). Dept. of Earth and Planetary Science
  4. Univ. of California, Berkeley, CA (United States). Dept. of Earth and Planetary Science. Miller Inst. for Basic Research in Science. Dept. of Astronomy

In situ x-ray synchrotron diffraction experiments were carried out on nickel-based high-strength superalloys under pressure to understand their deformation mechanism using a diamond anvil cell (DAC). Radial x-ray diffraction determines the room-temperature equations of state and yield strengths of binary Ni3Al alloy and 500 ppm boron-doped Ni3Al to pressures of 20 and 46 GPa, respectively. Crystallographic preferred orientations observed in these superalloys due to anisotropic stress field in DAC indicate the onset of plastic deformation. Inverse pole figure analysis reveals that the underlying deformation mechanisms change from an octahedral slip to a simultaneous activation of octahedral and cube slips upon doping with boron. The yield-strength values were found to increase with pressure and are comparable to those determined from axial diffraction experiments. The results indicate that the yield strength of Ni3Al:B is about 0.5 GPa higher (at pressures below 20 GPa) due to grain boundary strengthening by boron. It is shown that due to high elastic anisotropy of Ni3Al alloy, the yield-strength estimations from diffraction experiments strongly depend on the micromechanical model used to convert the measured elastic strains into stresses.

Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS); Carnegie Inst. of Washington, Washington, DC (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES); USDOE National Nuclear Security Administration (NNSA)
Grant/Contract Number:
AC02-06CH11357; AC02-05CH11231; NA0001974; FG02-99ER45775
OSTI ID:
1812070
Journal Information:
Journal of Applied Physics, Vol. 129, Issue 22; ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
ENGLISH

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