Metal Nitride Electrode Stress and Chemistry Effects on Phase and Polarization Response in Ferroelectric Hf0.5Zr0.5O2 Thin Films
Journal Article
·
· Advanced Materials Interfaces
- Univ. of Virginia, Charlottesville, VA (United States)
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Abstract not provided.
- Research Organization:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States); Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE National Nuclear Security Administration (NNSA); USDOE Office of Science (SC); National Science Foundation (NSF)
- Grant/Contract Number:
- AC05-00OR22725; NA0003525; DMR-1626201; DGE-1842490; AC04-94AL85000; DE‐NA‐0003525
- OSTI ID:
- 1779120
- Alternate ID(s):
- OSTI ID: 1781573; OSTI ID: 1785766
- Report Number(s):
- SAND-2021-5021J
- Journal Information:
- Advanced Materials Interfaces, Vol. 8, Issue 10; ISSN 2196-7350
- Publisher:
- Wiley-VCHCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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