Freestanding Photoresist Film: A Versatile Template for Three-Dimensional Micro- and Nanofabrication

Liu, Yuyang; Du, Ke; Wathuthanthri, Ishan; Xu, Wei; Choi, Chang‐Hwan

doi:10.1002/adfm.202004129

Title: Freestanding Photoresist Film: A Versatile Template for Three-Dimensional Micro- and Nanofabrication

Journal Article · Wed Aug 19 00:00:00 EDT 2020 · Advanced Functional Materials

DOI:https://doi.org/10.1002/adfm.202004129· OSTI ID:1661641

Liu, Yuyang ^[1]; Du, Ke ^[2]; Wathuthanthri, Ishan ^[3]; Xu, Wei ^[4];

^[1]

Stevens Inst. of Technology, Hoboken, NJ (United States)
Stevens Inst. of Technology, Hoboken, NJ (United States); Rochester Inst. of Technology, NY (United States)
Stevens Inst. of Technology, Hoboken, NJ (United States); Northrop Grumman Mission Systems, Linthicum, MD (United States)
Stevens Inst. of Technology, Hoboken, NJ (United States); Brookhaven National Lab. (BNL), Upton, NY (United States)

Ultrathin freestanding films with well-defined micro/nanostructures and robust mechanical properties are applied in many engineering applications including microelectronics, optics, filtration and separation, biomedical engineering, and nanotechnology. Although considerable efforts have been made toward the fabrication of freestanding thin films, it is still a significant challenge to develop a simple and reliable process for producing freestanding films with ultrathin thickness, well-regulated micro/nanopatterns, robust mechanical properties, macroscopic coverage area, and multi-layered composite structures. In this work, a significant advancement is reported in this regard. This study shows a new sacrificial-layer-free (SLF) lifting-off process, integrated with conventional micro- and nanolithography, enabling the release of micro- and nanopatterned photoresist (PR) films from the supporting substrate with unprecedented pattern coverage and structure characteristics. The freestanding PR film is resilient, can withstand significant bending and deformation, and is sufficiently flexible to be transferred onto substrates with 3D topography as a conformal soft stencil for further technological processing and applications. Moreover, the SLF lifting-off process provides a simple approach to prepare single-layered and multi-layered freestanding composite films. The results suggest that the novel SLF lifting-off process can significantly extend the capability of 3D micro-/nanofabrication.

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Research Organization:: Brookhaven National Laboratory (BNL), Upton, NY (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: SC0012704; AC02-98CH10886; AC02‐98CH10886

OSTI ID:: 1661641

Alternate ID(s):: OSTI ID: 1651177

Report Number(s):: BNL-219828-2020-JAAM

Journal Information:: Advanced Functional Materials, Vol. 30, Issue 42; ISSN 1616-301X

Publisher:: WileyCopyright Statement

Country of Publication:: United States

Language:: English

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36 MATERIALS SCIENCE
3D nanofabrication
photoresist films
scaffolds
self-delamination
stencils

Title: Freestanding Photoresist Film: A Versatile Template for Three-Dimensional Micro- and Nanofabrication

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