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Title: Nanoscale “Quantum” Islands on Metal Substrates: Microscopy Studies and Electronic Structure Analyses

Journal Article · · Materials
DOI:https://doi.org/10.3390/ma3073965· OSTI ID:1628423
 [1];  [2];  [2];  [2];  [3];  [4]
  1. Iowa State Univ., Ames, IA (United States). Inst. of Physical Research and Technology
  2. Ames Lab., Ames, IA (United States). Dept. of Materials Science and Engineering. Dept. of Chemistry
  3. Ames Lab., and Iowa State Univ., Ames, IA (United States). Dept. of Physics and Astronomy
  4. Ames Lab., and Iowa State Univ., Ames, IA (United States)

Confinement of electrons can occur in metal islands or in continuous films grown heteroepitaxially upon a substrate of a different metal or on a metallic alloy. Associated quantum size effects (QSE) can produce a significant height-dependence of the surface free energy for nanoscale thicknesses of up to 10–20 layers. This may suffice to induce height selection during film growth. Scanning STM analysis has revealed remarkable flat-topped or mesa-like island and film morphologies in various systems. We discuss in detail observations of QSE and associated film growth behavior for Pb/Cu(111), Ag/Fe(100), and Cu/fcc-Fe/Cu(100) [A/B or A/B/A], and for Ag/NiAl(110) with brief comments offered for Fe/Cu3Au(001) [A/BC binary alloys]. We also describe these issues for Ag/5-fold i-Al-Pd-Mn and Bi/5-fold i-Al-Cu-Fe [A/BCD ternary icosohedral quasicrystals]. Electronic structure theory analysis, either at the level of simple free electron gas models or more sophisticated Density Functional Theory calculations, can provide insight into the QSE-mediated thermodynamic driving force underlying height selection.

Research Organization:
Ames Laboratory (AMES), Ames, IA (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division
Grant/Contract Number:
AC02-07CH11358
OSTI ID:
1628423
Journal Information:
Materials, Vol. 3, Issue 7; ISSN 1996-1944
Publisher:
MDPICopyright Statement
Country of Publication:
United States
Language:
English

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