Stable Silicene in Graphene/Silicene Van der Waals Heterostructures
- Chinese Academy of Sciences (CAS), Beijing (China); Univ. of Maryland, College Park, MD (United States)
- Chinese Academy of Sciences (CAS), Beijing (China)
- Chinese Academy of Sciences (CAS), Beijing (China); Vanderbilt Univ., Nashville, TN (United States)
- Univ. of Maryland, College Park, MD (United States)
- Vanderbilt Univ., Nashville, TN (United States)
Silicene-based van der Waals heterostructures are theoretically predicted to have interesting physical properties, but their experimental fabrication has remained a challenge because of the easy oxidation of silicene in air. Here, the fabrication of graphene/silicene van der Waals heterostructures by silicon intercalation is reported. Density functional theory calculations show weak interactions between graphene and silicene layers, confirming the formation of van der Waals heterostructures. The heterostructures show no observable damage after air exposure for extended periods, indicating good air stability. The I–V characteristics of the vertical graphene/silicene/Ru heterostructures show rectification behavior.
- Research Organization:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States). National Energy Research Scientific Computing Center (NERSC); Univ. of California, Oakland, CA (United States); Vanderbilt Univ., Nashville, TN (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities Division
- Grant/Contract Number:
- AC02-05CH11231; FG02-09ER46554; DE‐FG02‐09ER46554; DE‐AC02‐05CH11231
- OSTI ID:
- 1543460
- Alternate ID(s):
- OSTI ID: 1479546; OSTI ID: 1597916
- Journal Information:
- Advanced Materials, Vol. 30, Issue 49; ISSN 0935-9648
- Publisher:
- WileyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Web of Science
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