Localized atmospheric laser chemical vapor deposition

Matthews, Manyalibo Joseph; Elhadj, Selim

Title: Localized atmospheric laser chemical vapor deposition

Patent · Tue Feb 19 00:00:00 EST 2019

OSTI ID:1503530

Matthews, Manyalibo Joseph; Elhadj, Selim

An atmospheric, Laser-based Chemical Vapor Deposition (LCVD) technique provides highly localized deposition of material to mitigate damage sites on an optical component. The same laser beam can be used to deposit material as well as for in-situ annealing of the deposited material. The net result of the LCVD process is in-filling and planarization of a treated site, which produces optically more damage resistant surfaces. Several deposition and annealing steps can be interleaved during a single cycle for more precise control on amount of deposited material as well as for increasing the damage threshold for the deposited material.

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Research Organization:: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)

Sponsoring Organization:: USDOE

DOE Contract Number:: AC52-07NA27344

Assignee:: Lawrence Livermore National Security, LLC (Livermore, CA)

Patent Number(s):: 10,208,377

Application Number:: 14/389,709

OSTI ID:: 1503530

Resource Relation:: Patent File Date: 2013 Apr 19

Country of Publication:: United States

Language:: English

References (9)

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Reactor for laser-assisted chemical vapor deposition Ahlgren, William L. https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/4987855 US Patent Document 4,987,855	patent	January 1991
Hybrid LCVD of micro-metallic lines for TFT-LCD circuit repair Park, J. B.; Kim, C. J.; Shin, P. E. Applied Surface Science, Vol. 253, Issue 2 https://doi.org/10.1016/j.apsusc.2006.06.054	journal	November 2006
Method and apparatus for field-emission high-pressure-discharge laser chemical vapor deposition of free-standing structures Maxwell, James L.; Boman, Mats https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/20060275537 US Patent Application 11/143179; 20060275537	patent-application	December 2006
Method and apparatus for performing pattern defect repair using Q-switched mode-locked pulse laser Kyusho, Yukio; Yoshino, Yoichi; Morishige, Yukio https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/6879605 US Patent Document 6,879,605	patent	April 2005
Gas barrier film, substrate film, and organic electroluminescence device Iwanaga, Hiroshi; Sakurai, Seiya https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7815981 US Patent Document 7,815,981	patent	October 2010
Thin film forming apparatus using laser Kojima, Kazuyoshi; Takami, Tetsuya; Kuroda, Kenichi https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/5622567 US Patent Document 5,622,567	patent	April 1997
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