Epitaxial Growth of BGaAs and BGaInAs by MOCVD: Preprint
Presented at the 2001 NCPV Program Review Meeting: Comparison of use of TMB, TEB, and BF3 to diborane for MOCVD growth of BGaInAs. BGaInAs can potentially be used in strain-free high-efficiency III-V solar cells, but the growth of sufficiently high-quality epitaxial BGaInAs using diborane has proven difficult. We compare the use of alternative boron precursors (trimethylboron [TMB], triethylboron [TEB], and boron trifluoride [BF{sub 3}]) with diborane for the MOCVD growth of these boron-containing III-V alloys. We find that TMB and BF{sub 3} do not result in significant boron incorporation into GaAs. TEB does result in boron incorporation in a manner very similar to diborane. Both diborane and TEB incorporate more efficiently using triethylgallium (TEG) rather than trimethylgallium (TMG), making TEG a preferred source of gallium for BGaAs epitaxy. Using TEB together with TEG, a higher boron composition (x = 4%-7%) has been achieved than has been previously reported, but we are still unable to achieve high- quality BGaInAs with the correct composition for solar cell applications.
- Research Organization:
- National Renewable Energy Lab. (NREL), Golden, CO (United States)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- AC36-99-GO10337
- OSTI ID:
- 15000022
- Report Number(s):
- NREL/CP-520-31014; TRN: US200325%%65
- Resource Relation:
- Journal Volume: 225; Journal Issue: 2-4; Conference: Presented at the NCPV Program Review Meeting, Lakewood, CO (US), 10/14/2001--10/17/2001; Other Information: PBD: 1 Oct 2001
- Country of Publication:
- United States
- Language:
- English
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