Study of the Au-Cr bilayer system using X-ray reflectivity, GDOES, and ToF-SIMS
- Sorbonne Univ., Paris cedex (France)
- Raja Ramanna Centre for Advanced Technology, Indore (India)
- Brookhaven National Lab. (BNL), Upton, NY (United States)
- HORIBA Scientific, Palaiseau (France)
- Institut de Recherche de Chimie Paris (IRCP), Paris (France)
Here, we study a Au (25 nm)/Cr (10 nm) bilayer system as a model of mirror for the soft X–ray energy range. The Au and Cr thin films are a few nanometer thick and are deposited on a float glass substrate. The sample is characterized by using 3 complementary techniques: soft X–ray reflectivity, glow discharge optical emission spectrometry (GDOES), and time–of–flight secondary ion mass spectroscopy (ToF–SIMS). Soft X–ray reflectivity provides information about the thickness and roughness of the different layers, while GDOES is used to obtain the elemental depth profile of the stack and ToF–SIMS to obtain the elemental and chemical depth profiles. GDOES and ToF–SIMS have both a nanometer depth resolution. A coherent description of the bilayer stack is obtained through the combination of these techniques. It consists in 5 layers namely a surface contamination layer, a principal gold layer, a Au–Cr mixed layer, a Cr layer, and another contamination layer at the top of the substrate.
- Research Organization:
- Brookhaven National Lab. (BNL), Upton, NY (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- SC0012704
- OSTI ID:
- 1438325
- Report Number(s):
- BNL-205686-2018-JAAM
- Journal Information:
- Surface and Interface Analysis, Vol. 50, Issue 11; ISSN 0142-2421
- Publisher:
- WileyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Web of Science
Similar Records
Ultra-shallow junction depth profile analysis using TOF-SIMS and TXRF
Surface characterization of Zr/Ti/Nb tri-layered films deposited by magnetron sputtering on Si(111) and stainless steel substrates