Comparative study of the oxidation of NiAl(100) by molecular oxygen and water vapor using ambient-pressure X-ray photoelectron spectroscopy
- State Univ. of New York, Binghamton, NY (United States)
- Brookhaven National Lab. (BNL), Upton, NY (United States)
The oxidation behavior of NiAl(100) by molecular oxygen and water vapor under a near-ambient pressure of 0.2 Torr is monitored using ambient-pressure X-ray photoelectron spectroscopy. O2 exposure leads to the selective oxidation of Al at temperatures ranging from 40 to 500 °C. By contrast, H2O exposure results in the selective oxidation of Al at 40 and 200 °C, and increasing the oxidation temperature above 300 °C leads to simultaneous formation of both Al and Ni oxides. Furthermore, these results demonstrate that the O2 oxidation forms a nearly stoichiometric Al2O3 structure that provides improved protection to the metallic substrate by barring the outward diffusion of metals. By contrast, the H2O oxidation results in the formation of a defective oxide layer that allows outward diffusion of Ni at elevated temperatures for simultaneous NiO formation.
- Research Organization:
- Brookhaven National Lab. (BNL), Upton, NY (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- SC00112704
- OSTI ID:
- 1345737
- Report Number(s):
- BNL-113577-2017-JA; KC0403020; TRN: US1701531
- Journal Information:
- Langmuir, Vol. 32, Issue 44; ISSN 0743-7463
- Publisher:
- American Chemical SocietyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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