Sub-nanometer interferometry and precision turning for large optical fabrication
At Lawrence Livermore National Laboratory (LLNL), we have the unique combination of precision turning and metrology capabilities critical to the fabrication of large optical elements. We have developed a self-referenced interferometer to measure errors in aspheric optics to sub- nanometer accuracy over 200-millimeter apertures, a dynamic range of 5{approximately}10. We have utilized diamond turning to figure optics for X-ray to IR wavelengths and, with fast-tool-servo technology, can move optical segments from off-axis to on-axis. With part capacities to 2.3-meters diameter and the metrology described above, segments of very large, ultra-lightweight mirrors can potentially be figured to final requirements. precision of diamond-turning will carryover although the surface finish may be degraded. Finally, the most critical component of a fabrication process is the metrology that enables an accurate part. Well characterized machines are very repeatable and part accuracy must come from proper metrology. A self- referencing interferometer has been developed that can measure accurately to sub-nanometer values. As with traditional interferometers, measurements are fast and post- processed data provides useful feedback to the user. The simplicity of the device allows it to be used on large optics and systems.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE Office of Defense Programs (DP) (US)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 12168
- Report Number(s):
- UCRL-JC-134052; YN0100000; YN0100000; TRN: AH200119%%364
- Resource Relation:
- Conference: Ultra Lightweight Space Optics, Napa, CA (US), 03/24/1999--03/25/1999; Other Information: PBD: 1 Apr 1999
- Country of Publication:
- United States
- Language:
- English
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