Poly(dimethylsiloxane-b-methyl methacrylate): A Promising Candidate for Sub-10 nm Patterning

Luo, Yingdong; Montarnal, Damien; Kim, Sangwon; Shi, Weichao; Barteau, Katherine P.; Pester, Christian W.; Hustad, Phillip D.; Christianson, Matthew D.; Fredrickson, Glenn H.; Kramer, Edward J.; Hawker, Craig J.

doi:10.1021/acs.macromol.5b00518

Title: Poly(dimethylsiloxane-b-methyl methacrylate): A Promising Candidate for Sub-10 nm Patterning

Journal Article · Tue May 19 00:00:00 EDT 2015 · Macromolecules

DOI:https://doi.org/10.1021/acs.macromol.5b00518· OSTI ID:1186927

Luo, Yingdong ^[1]; Montarnal, Damien ^[1]; Kim, Sangwon ^[2]; Shi, Weichao ^[1]; Barteau, Katherine P. ^[1]; Pester, Christian W. ^[1]; Hustad, Phillip D. ^[3]; Christianson, Matthew D. ^[4]; Fredrickson, Glenn H. ^[1]; Kramer, Edward J. ^[1]; Hawker, Craig J. ^[1]

Univ. of California, Santa Barbara, CA (United States)
Univ. of California, Santa Barbara, CA (United States); Inha Univ., Incheon (Korea)
Dow Electronic Materials, Marlborough, MA (United States)
The Dow Chemical Company, Midland, MI (United States)

We report herein the modular synthesis and nanolithographic potential of poly(dimethylsiloxane-block-methyl methacrylate) (PDMS-b-PMMA) with self-assembled domains approaching sub-10 nm periods. A straightforward and modular coupling strategy, optimized for low molecular weight diblocks and using copper-catalyzed azide–alkyne “click” cycloaddition, was employed to obtain a library of PDMS-b-PMMA and poly(dimethylsiloxane-block-styrene) (PDMS-b-PS) diblock copolymers. Flory–Huggins interaction parameters, determined from small-angle X-ray scattering experiments, were high for PDMS-b-PMMA (χ ~ 0.2 at 150 °C), suggesting this diblock copolymer system has promise for sub-10 nm lithographic applications when compared to the corresponding PDMS-b-PS diblock copolymers (χ ~ 0.1 at 150 °C). Furthermore, performance evaluation in thin film self-assembly experiments allowed domain periods as small as 12.1 nm to be obtained, which is among the smallest highly ordered nanoscale patterns reported hitherto for thermally annealed materials.

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Research Organization:: Argonne National Laboratory (ANL), Argonne, IL (United States)

Sponsoring Organization:: National Science Foundation (NSF)

Grant/Contract Number:: DMR-1121053

OSTI ID:: 1186927

Journal Information:: Macromolecules, Vol. 48, Issue 11; ISSN 0024-9297

Publisher:: American Chemical SocietyCopyright Statement

Country of Publication:: United States

Language:: ENGLISH

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Cited by: 112 works

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