Exploring the effect of Al2O3 ALD coating on a high gradient ILC single-cell cavity
Encouraged by work at Argonne National Lab, we investigated atomic layer deposition technique (ALD) for high gradient superconducting RF cavities at JLab with an ALD coating system of Old Dominion University located on the JLab site. The goal of this study was to look into the possibility of coating a dielectric layer on top of RF niobium surface at a lower temperature of 120 C as compared to ANL coatings at 200 C to preserve niobium pentoxide on niobium surface. The initial coatings showed complete, but non-uniform coatings of the surface with several areas exhibiting discoloration, which was probably due to the temperature variation across the cavity surface. The initial coating showed a high RF losses, which were improved after discolored areas on the beam tubes were removed with HF rinse of the beam tubes only. The best result was 2 109 low field Q0 and Eacc = 18 MV/m limited by available power.
- Research Organization:
- Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- AC05-06OR23177
- OSTI ID:
- 1048035
- Report Number(s):
- JLAB-ACC-12-1545; DOE/OR/23177-2130; TRN: US201216%%652
- Resource Relation:
- Conference: IPAC 2012, 20-25 May 2012, New Orleans, Louisiana
- Country of Publication:
- United States
- Language:
- English
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