Development of Thin Film Silicon Solar Cell Using Inkjet Printed Silicon and Other Inkjet Processes: Cooperative Research and Development Final Report, CRADA Number CRD-07-260

Technical Report · Sun Apr 01 00:00:00 EDT 2012

DOI:https://doi.org/10.2172/1043746· OSTI ID:1043746

Sopori, Bhushan

The cost of silicon photovoltaics (Si-PV) can be greatly lowered by developing thin-film crystalline Si solar cells on glass or an equally lower cost substrate. Typically, Si film is deposited by thermal evaporation, plasma enhanced chemical vapor deposition, and sputtering. NREL and Silexos have worked under a CRADA to develop technology to make very low cost solar cells using liquid organicprecursors. Typically, cyclopentasilane (CPS) is deposited on a glass substrate and then converted into an a-Si film by UV polymerization followed by low-temperature optical process that crystallizes the amorphous layer. This technique promises to be a very low cost approach for making a Si film.

• Research Organization: National Renewable Energy Lab. (NREL), Golden, CO (United States)
• Sponsoring Organization: USDOE Office of Energy Efficiency and Renewable Energy (EERE), Renewable Power Office. Solar Energy Technologies Office
• DOE Contract Number: AC36-08GO28308
• OSTI ID: 1043746
• Report Number(s): NREL/TP-7A10-53846; TRN: US201214%%168
• Country of Publication: United States
• Language: English

Related Subjects

14 SOLAR ENERGY
CHEMICAL VAPOR DEPOSITION
EVAPORATION
GLASS
PLASMA
POLYMERIZATION
SILICON
SILICON SOLAR CELLS
SOLAR CELLS
SPUTTERING
SUBSTRATES
THIN FILMS
CRADA
thin film silicon