Breakthroughs in photonics 2013: X-ray optics

Journal Article · Tue Apr 01 00:00:00 EDT 2014 · IEEE Photonics Journal (Online)

DOI:https://doi.org/10.1109/JPHOT.2014.2309640· OSTI ID:1266667

Soufli, Regina ^[1]

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1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

Here, this review discusses the latest advances in extreme ultraviolet/X-ray optics development, which are motivated by the availability and demands of new X-ray sources and scientific and industrial applications. Among the breakthroughs highlighted are the following: i) fabrication, metrology, and mounting technologies for large-area optical substrates with improved figure, roughness, and focusing properties; ii) multilayer coatings with especially optimized layer properties, achieving improved reflectance, stability, and out-of-band suppression; and iii) nanodiffractive optics with improved efficiency and resolution.

• Research Organization: Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
• Sponsoring Organization: USDOE
• Grant/Contract Number: AC52-07NA27344
• OSTI ID: 1266667
• Report Number(s): LLNL-JRNL-651182
• Journal Information: IEEE Photonics Journal (Online), Vol. 6, Issue 2; ISSN 1943-0655
• Publisher: IEEE
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
79 ASTRONOMY AND ASTROPHYSICS
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
x-ray optics
multilayer interference coatings
metrology
EUV
X-ray applications