Barrier-free subsurface incorporation of 3d metal atoms into Bi(111) films
- Univ. Duisburg-Essen, Duisburg (Germany)
- Univ. Paderborn, Paderborn (Germany)
- Brookhaven National Lab. (BNL), Upton, NY (United States)
- Univ. Hannover, Hannover (Germany)
By combining scanning tunneling microscopy with density functional theory it is shown that the Bi(111) surface provides a well-defined incorporation site in the first bilayer that traps highly coordinating atoms such as transition metals (TMs) or noble metals. All deposited atoms assume exactly the same specific sevenfold coordinated subsurface interstitial site while the surface topography remains nearly unchanged. Notably, 3d TMs show a barrier-free incorporation. The observed surface modification by barrier-free subsorption helps to suppress aggregation in clusters. Thus, it allows a tuning of the electronic properties not only for the pure Bi(111) surface, but may also be observed for topological insulators formed by substrate-stabilized Bi bilayers.
- Research Organization:
- Brookhaven National Laboratory (BNL), Upton, NY (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- SC00112704; AC02-98CH10886
- OSTI ID:
- 1214097
- Alternate ID(s):
- OSTI ID: 1183227
- Report Number(s):
- BNL-108267-2015-JA; PRBMDO; KC0403020
- Journal Information:
- Physical Review. B, Condensed Matter and Materials Physics, Vol. 91, Issue 19; ISSN 1098-0121
- Publisher:
- American Physical Society (APS)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
Web of Science
Controlling conductivity by quantum well states in ultrathin Bi(111) films
|
journal | January 2018 |
Quantum transport in the surface states of epitaxial Bi(111) thin films
|
journal | September 2016 |
Controlling conductivity by quantum well states in ultrathin Bi(111) films
|
other | January 2018 |
Similar Records
Understanding oxygen adsorption on 9.375 at. % Ga-stabilized δ-Pu (111) surface: A DFT study
Bi-enhanced N incorporation in GaAsNBi alloys