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Title: Plasma discharge self-cleaning filtration system

Patent ·
OSTI ID:1149693

The present invention is directed to a novel method for cleaning a filter surface using a plasma discharge self-cleaning filtration system. The method involves utilizing plasma discharges to induce short electric pulses of nanoseconds duration at high voltages. These electrical pulses generate strong Shockwaves that disintegrate and dislodge particulate matter located on the surface of the filter.

Research Organization:
National Energy Technology Laboratory (NETL), Pittsburgh, PA, Morgantown, WV (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
FC26-06NT42724
Assignee:
Drexel University (Philadelphia, PA)
Patent Number(s):
8,784,657
Application Number:
12/672,005
OSTI ID:
1149693
Resource Relation:
Patent File Date: 2008 Aug 07
Country of Publication:
United States
Language:
English

References (12)

Pulse power supply for generating extremely short pulse high voltages patent September 1985
Apparatus for plasma treatment of a gas patent May 2001
Vapor purification with self-cleaning filter patent December 2003
Apparatus and method for the removal of particulate matter in a filtration system patent March 2008
Methods for operating a filtration system patent May 2011
Filtration apparatus patent September 2011
Gas filter, process for producing a gas filter and use of this gas filter patent-application February 2002
Method for purifying and neutralizing polluted liquids and apparatus for implementing the method patent-application March 2002
Vapor purification with self-cleaning filter patent-application May 2003
Exhaust gas treating apparatus patent-application October 2005
Non-thermal plasma reactor patent-application August 2007
Bi-directional filtered arc plasma source patent-application November 2007

Cited By (1)

Plasma spark discharge reactor and durable electrode patent January 2017