Overpressure Contact Printing
This paper describes a new method of using elastometric stamps in the fabrication of patterned self-assembled monolayers and nanoparticles. By applying load on top of poly(dimethylsiloxane) (PDMS) stamps, we showed that new structure arrays of various materials could be generated on silicon wafer and metal substrates through the controlled deformation of elastometric stamps. The feature sizes of the patterns generated by this technique have been shown to be up to an order of a magnitude smaller than those on the stamps. The created patterns also may not exist on the original masters; thus, this approah can be unique in making patterns at a reduced size that can sometimes be hard to fabricate otherwise.
- Research Organization:
- Laboratory for Laser Energetics
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- FC52-92SF19460
- OSTI ID:
- 834973
- Report Number(s):
- DOE/SF-19460-553; 1477; 2004-73; TRN: US200720%%114
- Journal Information:
- Nano Letters, Vol. 4, Issue 9
- Country of Publication:
- United States
- Language:
- English
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