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Title: Microbial release of sulphur ions from atmospheric pollution deposits

Journal Article · · J. Appl. Physiol.; (United States)
DOI:https://doi.org/10.2307/2402379· OSTI ID:6858836

The surface of leaves of Acer pseudoplatanus growing in areas exposed to heavy atmospheric pollution are covered with atmospheric pollution deposits (APD). Using scanning electric microscopy, micro-organisms were seen to be growing in intimate association with these deposits. The deposits contained sufficient carbon and nitrogen to support growth of the fungus Fusarium solani in culture and in autoclaved and non-sterilized soils; and sufficient reduced sulphur for in vitro growth of Thiobacillus thioparus. When T. thioparus and F. solani were grown in medium supplemented with APD as sole carbon and nitrogen sources, increases in the concentrations of soluble S/sub 2/O/sub 3//sup 2/ btw/sup -/ and; S/sub 4/O/sub 6//sup 2 -/ and SO/sub 4//sup 2 -/ resulted. Similar increases also occurred when APD was added to complete fungal growth medium. Increases in LiCl/sub 2/-extractable sulphur-ions also occurred is fresh soil amended with APD, and in autoclaved soils containing APD, and inoculated with spores of F. solani. Arylsulphatase activity increased in fresh soils and in soils autoclaved and inoculated with F. solani when APD was added; suggesting sulphur mineralization, as well as sulphur oxidation, in the release of sulphur ions from APD. We conclude that APD can support microbial growth in vitro and in soils when provided as sole carbon and sulphur source; and that micro-organisms can release sulphur ions from this complex substrate. Microbial release of sulphur ions from APD can account in part for the increased concentrations of sulphur ions in heavy atmospheric-polluted soils.

Research Organization:
Univ. of Sheffield, England
OSTI ID:
6858836
Journal Information:
J. Appl. Physiol.; (United States), Vol. 18:3
Country of Publication:
United States
Language:
English