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Title: Plasma distribution of cathodic ARC deposition system

The plasma distribution using a cathodic arc plasma source with and without magnetic macroparticle filter has been determined by depositing on a transparent plastic substrate and measuring the film absorption. It was found that the width of the distribution depends on the arc current, and it also depends on the cathode material which leads to a spatial separation of the elements when an alloy cathode is used. By applying a magnetic multicusp field near the exit of the magnetic filter, it was possible to modify the plasma distribution and obtain a flat plasma profile with a constant and homogeneous elemental distribution.
Authors:
; ; ; ;  [1]
  1. Lawrence Berkeley National Lab., CA (United States)
Publication Date:
OSTI Identifier:
387461
Report Number(s):
LBNL--38845; CONF-9509356--
ON: DE96014963; TRN: 96:027269
DOE Contract Number:
AC03-76SF00098
Resource Type:
Conference
Resource Relation:
Conference: Workshop on vacuum arc ion sources, Berkeley, CA (United States), 18-20 Sep 1995; Other Information: PBD: Aug 1996; Related Information: Is Part Of Proceedings of the workshop on vacuum arc ion sources; Brown, I. [ed.]; PB: 142 p.
Research Org:
Lawrence Berkeley Lab., CA (United States)
Country of Publication:
United States
Language:
English
Subject:
66 PHYSICS; ION SOURCES; BEAM PROFILES; PLASMA; SPATIAL DISTRIBUTION; ELECTRIC ARCS; CATHODE SPUTTERING