Plasma distribution of cathodic ARC deposition system
The plasma distribution using a cathodic arc plasma source with and without magnetic macroparticle filter has been determined by depositing on a transparent plastic substrate and measuring the film absorption. It was found that the width of the distribution depends on the arc current, and it also depends on the cathode material which leads to a spatial separation of the elements when an alloy cathode is used. By applying a magnetic multicusp field near the exit of the magnetic filter, it was possible to modify the plasma distribution and obtain a flat plasma profile with a constant and homogeneous elemental distribution.
- Publication Date:
- OSTI Identifier:
- Report Number(s):
- LBNL--38845; CONF-9509356--
ON: DE96014963; TRN: 96:027269
- DOE Contract Number:
- Resource Type:
- Resource Relation:
- Conference: Workshop on vacuum arc ion sources, Berkeley, CA (United States), 18-20 Sep 1995; Other Information: PBD: Aug 1996; Related Information: Is Part Of Proceedings of the workshop on vacuum arc ion sources; Brown, I. [ed.]; PB: 142 p.
- Research Org:
- Lawrence Berkeley Lab., CA (United States)
- Country of Publication:
- United States
- 66 PHYSICS; ION SOURCES; BEAM PROFILES; PLASMA; SPATIAL DISTRIBUTION; ELECTRIC ARCS; CATHODE SPUTTERING
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