Modification of cathodic arc deposition profiles by magnetic multicusps
Conference
·
OSTI ID:441560
- Lawrence Berkeley National Lab., CA (United States)
The deposition profile of a cathodic arc plasma source with and without magnetic macroparticle filter has been measured using a deposition probe technique. It has been found that the profile is close to a Gaussian and that the width of the profile depends on the cathode material. It was found that the dependence on the cathode material leads to a considerable radial variation of the elemental composition of the film when an alloy cathode is used. A magnetic multicusp field (magnetic bucket) near the exit of the plasma source or the magnetic filter was applied to flatten and homogenize the deposition profile.
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 441560
- Report Number(s):
- CONF-960723--
- Country of Publication:
- United States
- Language:
- English
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