Plasma distribution of cathodic ARC deposition system
- Lawrence Berkeley National Lab., CA (United States)
The plasma distribution using a cathodic arc plasma source with and without magnetic macroparticle filter has been determined by depositing on a transparent plastic substrate and measuring the film absorption. It was found that the width of the distribution depends on the arc current, and it also depends on the cathode material which leads to a spatial separation of the elements when an alloy cathode is used. By applying a magnetic multicusp field near the exit of the magnetic filter, it was possible to modify the plasma distribution and obtain a flat plasma profile with a constant and homogeneous elemental distribution.
- Research Organization:
- Lawrence Berkeley Lab., CA (United States)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 387461
- Report Number(s):
- LBNL--38845; CONF-9509356--; ON: DE96014963
- Country of Publication:
- United States
- Language:
- English
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