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Title: Grain orientation mapping of passivated aluminum interconnect lines with X-ray micro-diffraction

A micro x-ray diffraction facility is under development at the Advanced Light Source. Spot sizes are typically about 1-{micro}m size generated by means of grazing incidence Kirkpatrick-Baez focusing mirrors. Photon energy is either white of energy range 6--14 keV or monochromatic generated from a pair of channel cut crystals. Laue diffraction pattern from a single grain in a passivated 2-{micro}m wide bamboo structured Aluminum interconnect line has been recorded. Acquisition times are of the order of seconds. The Laue pattern has allowed the determination of the crystallographic orientation of individual grains along the line length. The experimental and analysis procedure used is described, as is the latest grain orientation result. The impact of x-ray micro-diffraction and its possible future direction are discussed in the context of other developments in the area of electromigration, and other technological problems.
Authors:
;  [1] ; ; ;  [2]
  1. Lawrence Berkeley National Lab., CA (United States). Advanced Light Source Div.|[Stanford Univ., CA (United States)
  2. Lawrence Berkeley National Lab., CA (United States)
Publication Date:
OSTI Identifier:
291048
Report Number(s):
LBNL--41018; LSBL--458;CONF-980364--
ON: DE98058298; TRN: 99:002153
DOE Contract Number:
AC03-76SF00098
Resource Type:
Conference
Resource Relation:
Conference: 1998 international conference on characterization and metrology for ULSI technology, Gaithersburg, MD (United States), 23-27 Mar 1998; Other Information: PBD: [1998]
Research Org:
Lawrence Berkeley National Lab., Advanced Light Source Div., Berkeley, CA (United States)
Sponsoring Org:
USDOE Office of Energy Research, Washington, DC (United States)
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; 36 MATERIALS SCIENCE; 66 PHYSICS; X-RAY DIFFRACTION; ACCELERATOR FACILITIES; LAUE METHOD; ALUMINIUM; GRAIN ORIENTATION; INTEGRATED CIRCUITS