TEM investigation of the surface layer structure [111]{sub B2} of the single NiTi crystal modified by the Si-ion beam implantation

Journal Article · Tue Oct 27 00:00:00 EDT 2015 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.4932747· OSTI ID:22492525

Girsova, S. L., E-mail: [e-mail]; Poletika, T. M., E-mail: [e-mail] ^[1]; Meisner, S. N., E-mail: [e-mail]; Meisner, L. L., E-mail: [e-mail] ^[1]; National Research Tomsk State University, Tomsk, 634050 ^[2]

---

1. Institute of Strength Physics and Materials Science SB RAS, Tomsk, 634055 (Russian Federation)
2. (Russian Federation)

The study was carried on for the single NiTi crystals subjected to the Si-ion beam implantation. Using the transmission electron microscopy technique (TEM), the surface layer structure [111]{sub B2} was examined for the treated material. The modified near-surface sublayers were found to have different composition. Thus the uppermost sublayer contained mostly oxides; the lower-lying modified sublayer material was in an amorphous state and the thin underlying sublayer had a defect structure.

• OSTI ID: 22492525
• Journal Information: AIP Conference Proceedings, Vol. 1683, Issue 1; Conference: International conference on advanced materials with hierarchical structure for new technologies and reliable structures 2015, Tomsk (Russian Federation), 21-25 Sep 2015; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
36 MATERIALS SCIENCE
AMORPHOUS STATE
CRYSTALS
DEFECTS
ION BEAMS
LAYERS
NICKEL COMPOUNDS
OXIDES
SILICON IONS
SURFACES
TITANIUM COMPOUNDS
TRANSMISSION ELECTRON MICROSCOPY