Correlation between vibrational temperature of N{sub 2} and plasma parameters in inductively coupled Ar/N{sub 2} plasmas
- Department of Nanoscale Semiconductor Engineering, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul 133-791 (Korea, Republic of)
- Department of Electrical Engineering, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul 133-791 (Korea, Republic of)
Vibrational temperature (T{sub vib}) of N{sub 2} gas and electron energy distribution function (EEDF) were measured in Ar/N{sub 2} mixture inductively coupled plasma (ICP). At a low gas pressure of 5 mTorr where the EEDF is bi-Maxwellian distribution, plasma density n{sub p} and T{sub vib} (from 7000 K to 5600 K) slightly decrease. However, remarkable decrease in n{sub p} and T{sub vib} is found with the dilution of N{sub 2} gas at a high gas pressure of 50 mTorr, where the EEDF is depleted Maxwellian distribution at a fixed ICP power of 150 W. When the ICP power increases from 150 W to 300 W at the gas pressure of 50 mTorr, the depleted tail on the EEDF is replenished, while n{sub p} is little changed with the dilution of N{sub 2} gas. In this case, T{sub vib} slightly decreases from 9500 K to 7600 K. These results indicate that the variation of T{sub vib} is strongly correlated to the plasma parameters, such as the plasma density and EEDF.
- OSTI ID:
- 22490097
- Journal Information:
- Physics of Plasmas, Vol. 22, Issue 8; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
- Country of Publication:
- United States
- Language:
- English
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