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Title: C ion-implanted TiO{sub 2} thin film for photocatalytic applications

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4915111· OSTI ID:22399276
; ;  [1];  [1];  [1];  [2]
  1. CNR-IMM MATIS, Via S. Sofia 64, 95123 Catania (Italy)
  2. Université de Toulouse, CEMES CNRS, 29 rue Marvig, BP 94347, 31055 Toulouse Cedex 4 (France)

Third-generation TiO{sub 2} photocatalysts were prepared by implantation of C{sup +} ions into 110 nm thick TiO{sub 2} films. An accurate structural investigation was performed by Rutherford backscattering spectrometry, secondary ion mass spectrometry, X-ray diffraction, Raman-luminescence spectroscopy, and UV/VIS optical characterization. The C doping locally modified the TiO{sub 2} pure films, lowering the band-gap energy from 3.3 eV to a value of 1.8 eV, making the material sensitive to visible light. The synthesized materials are photocatalytically active in the degradation of organic compounds in water under both UV and visible light irradiation, without the help of any additional thermal treatment. These results increase the understanding of the C-doped titanium dioxide, helpful for future environmental applications.

OSTI ID:
22399276
Journal Information:
Journal of Applied Physics, Vol. 117, Issue 10; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English