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Title: Sharp chemical interface in epitaxial Fe{sub 3}O{sub 4} thin films

Chemically sharp interface was obtained on single phase single oriented Fe{sub 3}O{sub 4} (001) thin film (7 nm) grown on NiO (001) substrate using oxygen assisted molecular beam epitaxy. Refinement of the atomic structure, stoichiometry, and oxygen vacancies were determined by soft and hard x-ray photoelectron spectroscopy, low energy electron diffraction and synchrotron based X-ray reflectivity, and X-ray diffraction. Our results demonstrate an epitaxial growth of the magnetite layer, perfect iron stoichiometry, absence of oxygen vacancies, and the existence of an intermixing free interface. Consistent magnetic and electrical characterizations are also shown.
Authors:
 [1] ; ; ; ;  [1] ;  [2]
  1. SpLine, Spanish CRG Beamline at the European Synchrotron Radiation Facility, B.P. 200, F-38043 Grenoble (France)
  2. (Spain)
Publication Date:
OSTI Identifier:
22395523
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 105; Journal Issue: 24; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ELECTRON DIFFRACTION; FERRITES; HARD X RADIATION; INTERFACES; IRON; IRON OXIDES; LAYERS; MAGNETITE; MOLECULAR BEAM EPITAXY; NICKEL OXIDES; OXYGEN; PHOTOELECTRON SPECTROSCOPY; REFLECTIVITY; STOICHIOMETRY; SUBSTRATES; THIN FILMS; VACANCIES; X-RAY DIFFRACTION