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Title: Local elastic modulus of RF sputtered HfO{sub 2} thin film by atomic force acoustic microscopy

Atomic force acoustic microscopy (AFAM) is a useful nondestructive technique for measurement of local elastic modulus of materials at nano-scale spatial resolution by measuring the contact resonance spectra for higher order modes of the AFM cantilever. The elastic modulus of RF sputtered HfO{sub 2} thin film has been measured quantitatively, using reference approach in which measurements are performed on the test and reference samples. Using AFAM, the measured elastic modulus of the HfO{sub 2} thin film is 223±27 GPa, which is in agreement with the literature value of 220±40 GPa for atomic layer deposited HfO{sub 2} thin film using nanoindentation technique.
Authors:
; ; ; ;  [1] ; ;  [2]
  1. Atomic and Molecular Physics Division, Bhabha Atomic Research Centre, Trombay, Mumbai-400 085 (India)
  2. Optics and Thin Film Laboratory, Autonagar, BARC-Vizag, Visakhapatnam-530 012 (India)
Publication Date:
OSTI Identifier:
22271046
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 1591; Journal Issue: 1; Conference: 58. DAE solid state physics symposium 2013, Patiala, Punjab (India), 17-21 Dec 2013; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ACOUSTIC MICROSCOPY; ATOMIC FORCE MICROSCOPY; DEPOSITION; ELASTICITY; HAFNIUM OXIDES; LAYERS; PRESSURE RANGE GIGA PA; SPATIAL RESOLUTION; SPUTTERING; THIN FILMS; YOUNG MODULUS