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Title: Note: An ion source for alkali metal implantation beneath graphene and hexagonal boron nitride monolayers on transition metals

The construction of an alkali-metal ion source is presented. It allows the acceleration of rubidium ions to an energy that enables the penetration through monolayers of graphene and hexagonal boron nitride. Rb atoms are sublimated from an alkali-metal dispenser. The ionization is obtained by surface ionization and desorption from a hot high work function surface. The ion current is easily controlled by the temperature of ionizer. Scanning Tunneling Microscopy measurements confirm ion implantation.
Authors:
 [1] ; ; ; ;  [2]
  1. Instituto de Física “Gleb Wataghin”, Universidade Estadual de Campinas, 13083-859, Campinas, SP (Brazil)
  2. Physik-Institut, Universität Zürich, Winterthurerstrasse 190, CH-8057 Zürich (Switzerland)
Publication Date:
OSTI Identifier:
22220233
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 84; Journal Issue: 12; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ACCELERATION; ATOMS; BORON NITRIDES; DESORPTION; GRAPHENE; ION IMPLANTATION; ION SOURCES; RUBIDIUM; RUBIDIUM IONS; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTOR MATERIALS; SURFACE IONIZATION; SURFACES; TRANSITION ELEMENTS; WORK FUNCTIONS