Note: An ion source for alkali metal implantation beneath graphene and hexagonal boron nitride monolayers on transition metals

Journal Article · Sun Dec 15 00:00:00 EST 2013 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.4848936· OSTI ID:22220233

Lima, L. H. de ^[1]; Cun, H. Y.; Hemmi, A.; Kälin, T.; Greber, T. ^[2]

---

1. Instituto de Física “Gleb Wataghin”, Universidade Estadual de Campinas, 13083-859, Campinas, SP (Brazil)
2. Physik-Institut, Universität Zürich, Winterthurerstrasse 190, CH-8057 Zürich (Switzerland)

The construction of an alkali-metal ion source is presented. It allows the acceleration of rubidium ions to an energy that enables the penetration through monolayers of graphene and hexagonal boron nitride. Rb atoms are sublimated from an alkali-metal dispenser. The ionization is obtained by surface ionization and desorption from a hot high work function surface. The ion current is easily controlled by the temperature of ionizer. Scanning Tunneling Microscopy measurements confirm ion implantation.

• OSTI ID: 22220233
• Journal Information: Review of Scientific Instruments, Vol. 84, Issue 12; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ACCELERATION
ATOMS
BORON NITRIDES
DESORPTION
GRAPHENE
ION IMPLANTATION
ION SOURCES
RUBIDIUM
RUBIDIUM IONS
SCANNING TUNNELING MICROSCOPY
SEMICONDUCTOR MATERIALS
SURFACE IONIZATION
SURFACES
TRANSITION ELEMENTS
WORK FUNCTIONS