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Patterning monolayer graphene with zigzag edges on hexagonal boron nitride by anisotropic etching

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4959963· OSTI ID:22594397
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  1. Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing 100190 (China)
  2. National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044 (Japan)
Graphene nanostructures are potential building blocks for nanoelectronic and spintronic devices. However, the production of monolayer graphene nanostructures with well-defined zigzag edges remains a challenge. In this paper, we report the patterning of monolayer graphene nanostructures with zigzag edges on hexagonal boron nitride (h-BN) substrates by an anisotropic etching technique. We found that hydrogen plasma etching of monolayer graphene on h-BN is highly anisotropic due to the inert and ultra-flat nature of the h-BN surface, resulting in zigzag edge formation. The as-fabricated zigzag-edged monolayer graphene nanoribbons (Z-GNRs) with widths below 30 nm show high carrier mobility and width-dependent energy gaps at liquid helium temperature. These high quality Z-GNRs are thus ideal structures for exploring their valleytronic or spintronic properties.
OSTI ID:
22594397
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 5 Vol. 109; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English