Simulation of parameter scaling in electron cyclotron resonance ion source plasmas using the GEM code

Journal Article · Mon Feb 15 00:00:00 EST 2010 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.3259166· OSTI ID:22053652

Cluggish, B; Zhao, L; Kim, J S ^[1]

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1. FAR-TECH, Inc., 3550 General Atomics Court, MS 15-155, San Diego, California 92121 (United States)

Although heating power and gas pressure are two of the two of primary experimental ''knobs'' available to users of electron cyclotron resonance ion sources, there is still no clear understanding of how they interact in order to provide optimal plasma conditions. FAR-TECH, Inc. has performed a series of simulations with its generalized electron cyclotron resonance ion source model in which the power and pressure were varied over a wide range. Analysis of the numerical data produces scaling laws that predict the plasma parameters as a function of the power and pressure. These scaling laws are in general agreement with experimental data.

• OSTI ID: 22053652
• Journal Information: Review of Scientific Instruments, Vol. 81, Issue 2; Conference: ICIS 2009: 13. international conference on ion sources, Gatlinburg, TN (United States), 20-25 Sep 2009; Other Information: (c) 2010 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
ECR ION SOURCES
EXPERIMENTAL DATA
PLASMA
RADIOWAVE RADIATION
RF SYSTEMS
SCALING LAWS
SIMULATION