Measurement of electron temperatures and electron energy distribution functions in dual frequency capacitively coupled CF{sub 4}/O{sub 2} plasmas using trace rare gases optical emission spectroscopy
- Department of Chemical and Biomolecular Engineering, Plasma Processing Laboratory, University of Houston, Houston, Texas 77204-4004 (United States)
Measurements of electron temperatures (T{sub e}) and electron energy distribution functions (EEDFs) in a dual frequency capacitively coupled etcher were performed by using trace rare gas optical emission spectroscopy (TRG-OES). The parallel plate etcher was powered by a high frequency (60 MHz) ''source'' top electrode and a low frequency (13.56 MHz) ''substrate'' bottom electrode. T{sub e} first increased with pressure up to {approx}20 mTorr and then decreased at higher pressures. Increasing the bottom rf power resulted in higher electron temperatures. Electron temperatures in 90% CF{sub 4}+10% O{sub 2} plasmas were similar to those in 80% CF{sub 4}+20% O{sub 2} plasmas. EEDF exhibited bi-Maxwellian characteristics with enhanced high energy tail, especially at pressures >20 mTorr.
- OSTI ID:
- 22051008
- Journal Information:
- Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Vol. 27, Issue 5; Other Information: (c) 2009 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1553-1813
- Country of Publication:
- United States
- Language:
- English
Similar Records
Combined effects of gas pressure and exciting frequency on electron energy distribution functions in hydrogen capacitively coupled plasmas
Electron heating mode transition induced by mixing radio frequency and ultrahigh frequency dual frequency powers in capacitive discharges