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Title: Thermoelectric properties of electrically stressed Sb/Bi-Sb-Te multilayered films

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3326878· OSTI ID:21476172
;  [1];  [2]
  1. Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan (China)
  2. Thermal Management Materials and Device Laboratory, Industrial Technology Research Institute, Hsinchu 31040, Taiwan (China)

Electrically stressed Bi-Sb-Te thin films have demonstrated markedly enhanced Hall mobility and moderately reduced carrier concentration. To lower electrical resistivity further, a Sb-inserted Bi-Sb-Te multilayer structure was prepared through consecutively sputtering Bi-Sb-Te and Sb layers followed by electric current stressing. The electrically stressed Sb/Bi-Sb-Te film demonstrates high carrier concentration and enhanced Hall mobility. We propose that the additional Sb supply suppresses electromigration-induced Sb depletion in crystal lattices, thus maintains high carrier concentration of the Bi-Sb-Te film. The presented approach provides a simple means to optimize thermoelectric properties of Bi-Sb-Te films.

OSTI ID:
21476172
Journal Information:
Journal of Applied Physics, Vol. 107, Issue 6; Other Information: DOI: 10.1063/1.3326878; (c) 2010 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English