Origins of enhanced thermoelectric power factor in topologically insulating Bi{sub 0.64}Sb{sub 1.36}Te{sub 3} thin films

Journal Article · Mon Jan 25 00:00:00 EST 2016 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4940923· OSTI ID:22489381

Liu, Wei ^[1]; Chi, Hang; Walrath, J. C.; Chang, A. S.; Stoica, Vladimir A.; Endicott, Lynn; Uher, Ctirad ^[1]; Tang, Xinfeng ^[2]; Goldman, R. S. ^[1]

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1. Department of Physics, University of Michigan, Ann Arbor, Michigan 48109 (United States)
2. State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070 (China)

In this research, we report the enhanced thermoelectric power factor in topologically insulating thin films of Bi{sub 0.64}Sb{sub 1.36}Te{sub 3} with a thickness of 6–200 nm. Measurements of scanning tunneling spectroscopy and electronic transport show that the Fermi level lies close to the valence band edge, and that the topological surface state (TSS) is electron dominated. We find that the Seebeck coefficient of the 6 nm and 15 nm thick films is dominated by the valence band, while the TSS chiefly contributes to the electrical conductivity. In contrast, the electronic transport of the reference 200 nm thick film behaves similar to bulk thermoelectric materials with low carrier concentration, implying the effect of the TSS on the electronic transport is merely prominent in the thin region. The conductivity of the 6 nm and 15 nm thick film is obviously higher than that in the 200 nm thick film owing to the highly mobile TSS conduction channel. As a consequence of the enhanced electrical conductivity and the suppressed bipolar effect in transport properties for the 6 nm thick film, an impressive power factor of about 2.0 mW m{sup −1} K{sup −2} is achieved at room temperature for this film. Further investigations of the electronic transport properties of TSS and interactions between TSS and the bulk band might result in a further improved thermoelectric power factor in topologically insulating Bi{sub 0.64}Sb{sub 1.36}Te{sub 3} thin films.

• OSTI ID: 22489381
• Journal Information: Applied Physics Letters, Vol. 108, Issue 4; Other Information: (c) 2016 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
CARRIERS
ELECTRIC CONDUCTIVITY
FERMI LEVEL
POWER FACTOR
SPECTROSCOPY
SURFACES
TEMPERATURE RANGE 0273-0400 K
THERMOELECTRIC MATERIALS
THIN FILMS
TOPOLOGY