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Title: Development of measurement technique for carbon atoms employing vacuum ultraviolet absorption spectroscopy with a microdischarge hollow-cathode lamp and its application to diagnostics of nanographene sheet material formation plasmas

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3091279· OSTI ID:21352219
; ;  [1]; ;  [2];  [1]
  1. Department of Electric Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan)
  2. Department of Electrical and Electronic Engineering, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502 (Japan)

This study describes the development of a compact measurement technique for absolute carbon (C) atom density in processing plasmas, using vacuum ultraviolet absorption spectroscopy (VUVAS) employing a high-pressure CO{sub 2} microdischarge hollow-cathode lamp (C-MHCL) as the light source. The characteristics of the C-MHCL as a resonance line source of C atoms at 165.7 nm for VUVAS measurements of the absolute C atom density are reported. The emission line profile of the C-MHCL under typical operating conditions was estimated to be the Voigt profile with a DELTAnu{sub L}/DELTAnu{sub D} value of 2.5, where DELTAnu{sub L} is the Lorentz width and DELTAnu{sub D} is the Doppler width. In order to investigate the behavior of C and H atoms in the processing plasma used for the fabrication of two-dimensional nanographene sheet material, measurements of the atom densities were carried out using the VUVAS technique. The H atom density increased with increasing pressure, while the C atom density was almost constant at 5x10{sup 12} cm{sup -3}. The density ratio of C to H atoms in the plasma was found to influence the morphology of carbon nanowalls (CNWs). With increasing H/C density ratio, the growth rate decreased and the space between the walls of the CNWs became wider.

OSTI ID:
21352219
Journal Information:
Journal of Applied Physics, Vol. 105, Issue 11; Other Information: DOI: 10.1063/1.3091279; (c) 2009 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English