A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurements

Journal Article · Mon Oct 15 00:00:00 EDT 2007 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.2793508· OSTI ID:21024444

Arnalds, U B; Agustsson, J S; Ingason, A S; Eriksson, A K; Gylfason, K B; Gudmundsson, J T; Olafsson, S ^[1]

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1. Matvice, Dunhaga 3, IS-107 Reykjavik (Iceland)

We describe a versatile three gun magnetron sputtering system with a custom made sample holder for in situ electrical resistance measurements, both during film growth and ambient changes on film electrical properties. The sample holder allows for the preparation of patterned thin film structures, using up to five different shadow masks without breaking vacuum. We show how the system is used to monitor the electrical resistance of thin metallic films during growth and to study the thermodynamics of hydrogen uptake in metallic thin films. Furthermore, we demonstrate the growth of thin film capacitors, where patterned films are created using shadow masks.

• OSTI ID: 21024444
• Journal Information: Review of Scientific Instruments, Vol. 78, Issue 10; Other Information: DOI: 10.1063/1.2793508; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CAPACITORS
CHROMIUM ALLOYS
ELECTRIC CONDUCTIVITY
HYDROGEN
HYDROGENATION
MAGNESIUM
MAGNETRONS
MOLYBDENUM ALLOYS
MONITORS
PLATINUM
RESPIRATORS
SAMPLE HOLDERS
SPUTTERING
SURFACE COATING
THERMODYNAMIC PROPERTIES
THIN FILMS