Probe diagnostics of argon-oxygen-tetramethyltin capacitively coupled plasmas for the deposition of tin oxide thin films
- Laboratoire de Genie des procedes Plasmas, Ecole Nationale Superieure de Chimie Paris, Universite Pierre et Marie Curie, Paris 6 (France)
Langmuir probe measurements in nondepositing and depositing rf capacitively coupled (CCP) plasmas are briefly reviewed and compared to the results obtained in our rf system used for the deposition of tin oxide (SnO{sub 2}) thin films from argon-oxygen-tetamethyltin [Sn(CH{sub 3}){sub 4}] plasmas. Typically in our experimental conditions for tin oxide deposition, values of kT{sub eff}= 1.2-1.5 eV and n{sub e}=3-5x10{sup 9} cm{sup -3} were measured. These values are consistent with those generally reported in other depositing discharges. The shape of the electron energy probability function (EEPF), obtained from the Druyvesteyn procedure, was discussed too. As a consequence of the two electron heating mechanisms in capacitively coupled discharges, that is, ohmic and stochastic heating, the electrons have a bi-Maxwellian EEPF at low pressure (in the range of 10-100 mTorr). Moreover, a deep 'hole' appears in the EEPF at the energy which could correspond to the resonant peak of the vibrational excitation cross section of some molecules which can be present in the discharge, such as N{sub 2}, CH{sub 4}, or CO.
- OSTI ID:
- 20982791
- Journal Information:
- Journal of Applied Physics, Vol. 101, Issue 7; Other Information: DOI: 10.1063/1.2561749; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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