Real-time Optimization Method for Optical Parameters of Ion Implanters

Journal Article · Mon Nov 13 00:00:00 EST 2006 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.2401549· OSTI ID:20891845

Ogata, Seiji ^[1]; Nishihashi, Tsutomu; Tonari, Kazuhiko ^[2]; Yokoo, Hidekazu; Suzuki, Hideo; Hisamune, Takeshi ^[3]; Araki, Masasumi ^[4]

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1. ULVAC, Inc., Research and Development Div., 2500 Hagizono Chigasaki Kanagawa 253-8543 (Japan)
2. ULVAC, Inc., Inst. Semiconductor Technology, 1220-1 Suyama Susono Shizuoka 410-1231 (Japan)
3. ULVAC, Inc., Semiconductor Equipment Div. 2, 1220-14 Suyama Susono Shizuoka 410-1231 (Japan)
4. ULVAC, Inc., Software Development Control Solution Div., Hagizono Chigasaki Kanagawa 253-8543 (Japan)

Real-time optimization for optical parameters, such as applied voltage to the electrostatic quadrupole lens, has been realized by using newly developed high-speed computation algorithm for charged particle beams. The virtual optimization code has been incorporated in the control system of SOPHI-200, which is the ULVAC'S new medium current ion implanter. Automatic setup within 5minutes is achieved for any recipe of implantation.

• OSTI ID: 20891845
• Journal Information: AIP Conference Proceedings, Vol. 866, Issue 1; Conference: IIT 2006: 16. international conference on ion implantation technology, Marseille (France), 11-16 Jun 2006; Other Information: DOI: 10.1063/1.2401549; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
ALGORITHMS
CALCULATION METHODS
CHARGED PARTICLES
CONTROL SYSTEMS
ELECTRIC POTENTIAL
ION IMPLANTATION
OPTIMIZATION
QUADRUPOLES
REAL TIME SYSTEMS