Design and Performance Characteristics of the ORNL Advanced Microscopy Laboratory and JEOL 2200FS-AC Aberration-Corrected STEM/TEM
- ORNL
- Lawrence Berkeley National Laboratory (LBNL)
- JEOL USA
To achieve the highest performance with today's generation of aberration-corrected electron microscopes, it is increasingly evident that the environment of the facility in which the microscope is installed must be considered an integral component of the microscopy program. Such instruments are the world's best detectors of the influence of parameters such as alternating magnetic fields, floor vibrations, acoustic vibrations, airflow, and temperature and pressure fluctuations. At ORNL, the new Advanced Microscopy Laboratory (AML) has recently been completed, with two aberration-corrected instruments installed, and two more planned in the near future to fill the 4-laboratory building. Design criteria for the facility include the following: magnetic fields below 0.1mG rms in all directions, floor vibrations below 1{mu}m/sec, air flow less than 5cm/sec horizontally, temperature stability {+-}0.2 C/hr, and provision for instrument operation from an adjacent control room to minimize the influence of the operator on instrument performance. The JEOL 2200FS-AC, being installed as of this writing, has demonstrated a TEM information limit of 0.9 {angstrom}. This is the limit expected given the measured instrument parameters (HT and OL power supply stabilities, beam energy spread, etc.), and illustrates that the environmental influences are not adversely affecting the instrument performance. However, in STEM high-angle annular dark-field (HA-ADF) mode, images of a thin Si crystal in <1 1 0> zone axis orientation, after primary aberrations in the illuminating beam were optimally corrected, showed a significant vibration effect.
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). High Temperature Materials Lab. (HTML)
- Sponsoring Organization:
- USDOE Office of Energy Efficiency and Renewable Energy (EERE)
- DOE Contract Number:
- DE-AC05-00OR22725
- OSTI ID:
- 1003164
- Resource Relation:
- Conference: Microscopy and Microanalysis 2005, Honolulu, HI, USA, 20050731, 20050804
- Country of Publication:
- United States
- Language:
- English
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