Title: Demonstration of the DC-Kerr effect in silicon-rich nitride

Abstract

We demonstrate the DC-Kerr effect in plasma enhanced chemical vapor deposition (PECVD) silicon-rich nitride (SRN) and use it to demonstrate a third order nonlinear susceptibility, ${\mathrm{\chi \; <\#comment/>}}^{\left(3\right)}$ , as high as $(6\pm \; <\#comment/>0.58)\times \; <\#comment/>{10}^{-\; <\#comment/>19}{\mathrm{m}}^2/{\mathrm{V}}^2$ . We employ spectral shift versus applied voltage measurements in a racetrack resonator as a tool to characterize the nonlinear susceptibilities of these films. In doing so, we demonstrate a ${\mathrm{\chi \; <\#comment/>}}^{\left(3\right)}$ larger than that of silicon and argue that PECVD SRN can provide a versatile platform for employing optical phase shifters while maintaining a low thermal budget using a deposition technique readily available in CMOS process flows.

Authors:

Friedman, Alex  ^[1];

• Search DOE PAGES for author "Friedman, Alex"
• Search DOE PAGES for ORCID "0000-0002-3737-4140"

Nejadriahi, Hani  ^[1];

• Search DOE PAGES for author "Nejadriahi, Hani"
• Search DOE PAGES for ORCID "0000-0003-2968-7654"

Sharma, Rajat ^[1]; Fainman, Yeshaiahu ^[1]

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+ Show Author Affiliations

1. Univ. of California, San Diego, La Jolla, CA (United States)

Publication Date:

Wed Aug 25 00:00:00 EDT 2021

Research Org.:

Univ. of California, San Diego, La Jolla, CA (United States)

Sponsoring Org.:

USDOE Office of Science (SC); Cymer; Advanced Research Projects Agency–Energy; National Science Foundation (NSF); San Diego Nanotechnology Infrastructure; Army Research Office (ARO); US Department of the Navy, Office of Naval Research (ONR); USDOE Advanced Research Projects Agency - Energy (ARPA-E)

OSTI Identifier:

1852990

Alternate Identifier(s):

OSTI ID: 1814662

Grant/Contract Number:  

SC0019273; CBET-1704085; ECCS-2025752; ECCS-1542148; ECCS-180789; ECCS-190184: ECCS-2023730; DMR-1707641; ECCS-2025752ECCS-1542148

Resource Type:

Accepted Manuscript

Journal Name:

Optics Letters

Additional Journal Information:

Journal Volume: 46; Journal Issue: 17; Journal ID: ISSN 0146-9592

Publisher:

Optical Society of America (OSA)

Country of Publication:

United States

Language:

English

Subject:

42 ENGINEERING; optics