Argon metastable and resonant level densities in Ar and Ar/Cl2 discharges used for the processing of bulk niobium
Abstract
In this work, a comparative analysis of two popular spectroscopy techniques is conducted in a coaxial cylindrical capacitively coupled discharge designed for the plasma processing of superconducting radio frequency (SRF) cavities. The density of the metastable and resonant levels in Ar is measured in both Ar and Ar/Cl2 discharges to properly characterize the unique discharge system and aid in the development of a cavity etching routine. The first method, deemed the “branching fraction method,” utilizes the sensitivity of photon reabsorption of radiative decay to measure the lower state (metastable and resonant) densities by taking ratios of spectral lines with a common upper level. This method has been gaining popularity as it does not require any a priori knowledge about the electron energy distribution. The second method is a tunable diode laser absorption spectroscopy technique that measures the thermal Doppler broadening of spectral lines, from which the neutral gas temperature and lower state density of the transition can be evaluated. The two methods were conducted in tandem, while external parameters that were empirically determined to be important to the etching mechanism of SRF cavities are varied. Relationships between the excited state densities and the external parameters are presented for both spectroscopymore »
- Authors:
-
[1];
[1];
[1];
[2];
[1];
- Old Dominion Univ., Norfolk, VA (United States)
- Department of Physics and Astronomy, University of San Francisco, San Francisco, California 94117, USA
- Publication Date:
- Research Org.:
- Old Dominion Univ., Norfolk, VA (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC)
- OSTI Identifier:
- 1612167
- Grant/Contract Number:
- SC0014397
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Journal of Applied Physics
- Additional Journal Information:
- Journal Volume: 126; Journal Issue: 10; Journal ID: ISSN 0021-8979
- Publisher:
- American Institute of Physics (AIP)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; Physics; Spectroscopy; Atomic and molecular collisions; Plasma diagnostics; Superconductivity; Absorption spectroscopy; Lasers; Plasma properties and parameters; Plasma processing; Optical emission spectroscopy
Citation Formats
Peshl, Jeremy, McNeill, Roderick, Sukenik, Charles I., Nikolić, Milka, Popović, Svetozar, and Vŭsković, Leposava. Argon metastable and resonant level densities in Ar and Ar/Cl2 discharges used for the processing of bulk niobium. United States: N. p., 2019.
Web. doi:10.1063/1.5115043.
Peshl, Jeremy, McNeill, Roderick, Sukenik, Charles I., Nikolić, Milka, Popović, Svetozar, & Vŭsković, Leposava. Argon metastable and resonant level densities in Ar and Ar/Cl2 discharges used for the processing of bulk niobium. United States. https://doi.org/10.1063/1.5115043
Peshl, Jeremy, McNeill, Roderick, Sukenik, Charles I., Nikolić, Milka, Popović, Svetozar, and Vŭsković, Leposava. Mon .
"Argon metastable and resonant level densities in Ar and Ar/Cl2 discharges used for the processing of bulk niobium". United States. https://doi.org/10.1063/1.5115043. https://www.osti.gov/servlets/purl/1612167.
@article{osti_1612167,
title = {Argon metastable and resonant level densities in Ar and Ar/Cl2 discharges used for the processing of bulk niobium},
author = {Peshl, Jeremy and McNeill, Roderick and Sukenik, Charles I. and Nikolić, Milka and Popović, Svetozar and Vŭsković, Leposava},
abstractNote = {In this work, a comparative analysis of two popular spectroscopy techniques is conducted in a coaxial cylindrical capacitively coupled discharge designed for the plasma processing of superconducting radio frequency (SRF) cavities. The density of the metastable and resonant levels in Ar is measured in both Ar and Ar/Cl2 discharges to properly characterize the unique discharge system and aid in the development of a cavity etching routine. The first method, deemed the “branching fraction method,” utilizes the sensitivity of photon reabsorption of radiative decay to measure the lower state (metastable and resonant) densities by taking ratios of spectral lines with a common upper level. This method has been gaining popularity as it does not require any a priori knowledge about the electron energy distribution. The second method is a tunable diode laser absorption spectroscopy technique that measures the thermal Doppler broadening of spectral lines, from which the neutral gas temperature and lower state density of the transition can be evaluated. The two methods were conducted in tandem, while external parameters that were empirically determined to be important to the etching mechanism of SRF cavities are varied. Relationships between the excited state densities and the external parameters are presented for both spectroscopy methods and conclusions about the effects of these parameters on the discharge are stated when appropriate.},
doi = {10.1063/1.5115043},
journal = {Journal of Applied Physics},
number = 10,
volume = 126,
place = {United States},
year = {Mon Sep 09 00:00:00 EDT 2019},
month = {Mon Sep 09 00:00:00 EDT 2019}
}
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