How reduced vacuum pumping capability in a coating chamber affects the laser damage resistance of HfO2/SiO2 antireflection and high-reflection coatings
Abstract
Here, optical coatings with the highest laser damage thresholds rely on clean conditions in the vacuum chamber during the coating deposition process. A low-base pressure in the coating chamber, as well as the ability of the vacuum system to maintain the required pressure during deposition, are important aspects of limiting the amount of defects in an optical coating that could induce laser damage. Our large optics coating chamber at Sandia National Laboratories normally relies on three cryo pumps to maintain low pressures for e-beam coating processes. However, on occasion, one or more of the cryo pumps have been out of commission. In light of this circumstance, we explored how deposition under compromised vacuum conditions resulting from the use of only one or two cryo pumps affects the laser-induced damage thresholds of optical coatings. The coatings of this study consist of HfO2 and SiO2 layer materials and include antireflection coatings for 527 nm at normal incidence and high-reflection coatings for 527 nm at 45-deg angle of incidence in P-polarization.
- Authors:
-
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Publication Date:
- Research Org.:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Org.:
- USDOE National Nuclear Security Administration (NNSA)
- OSTI Identifier:
- 1356301
- Report Number(s):
- SAND-2016-5601J
Journal ID: ISSN 0091-3286; 653054
- Grant/Contract Number:
- AC04-94AL85000
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Optical Engineering
- Additional Journal Information:
- Journal Volume: 56; Journal Issue: 1; Journal ID: ISSN 0091-3286
- Publisher:
- SPIE
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; laser damage; optical coatings; HFO2; SiO2; vacuum; antireflection; high reflection
Citation Formats
Field, Ella S., Bellum, John C., and Kletecka, Damon E. How reduced vacuum pumping capability in a coating chamber affects the laser damage resistance of HfO2/SiO2 antireflection and high-reflection coatings. United States: N. p., 2016.
Web. doi:10.1117/1.OE.56.1.011005.
Field, Ella S., Bellum, John C., & Kletecka, Damon E. How reduced vacuum pumping capability in a coating chamber affects the laser damage resistance of HfO2/SiO2 antireflection and high-reflection coatings. United States. https://doi.org/10.1117/1.OE.56.1.011005
Field, Ella S., Bellum, John C., and Kletecka, Damon E. Fri .
"How reduced vacuum pumping capability in a coating chamber affects the laser damage resistance of HfO2/SiO2 antireflection and high-reflection coatings". United States. https://doi.org/10.1117/1.OE.56.1.011005. https://www.osti.gov/servlets/purl/1356301.
@article{osti_1356301,
title = {How reduced vacuum pumping capability in a coating chamber affects the laser damage resistance of HfO2/SiO2 antireflection and high-reflection coatings},
author = {Field, Ella S. and Bellum, John C. and Kletecka, Damon E.},
abstractNote = {Here, optical coatings with the highest laser damage thresholds rely on clean conditions in the vacuum chamber during the coating deposition process. A low-base pressure in the coating chamber, as well as the ability of the vacuum system to maintain the required pressure during deposition, are important aspects of limiting the amount of defects in an optical coating that could induce laser damage. Our large optics coating chamber at Sandia National Laboratories normally relies on three cryo pumps to maintain low pressures for e-beam coating processes. However, on occasion, one or more of the cryo pumps have been out of commission. In light of this circumstance, we explored how deposition under compromised vacuum conditions resulting from the use of only one or two cryo pumps affects the laser-induced damage thresholds of optical coatings. The coatings of this study consist of HfO2 and SiO2 layer materials and include antireflection coatings for 527 nm at normal incidence and high-reflection coatings for 527 nm at 45-deg angle of incidence in P-polarization.},
doi = {10.1117/1.OE.56.1.011005},
journal = {Optical Engineering},
number = 1,
volume = 56,
place = {United States},
year = {Fri Jul 15 00:00:00 EDT 2016},
month = {Fri Jul 15 00:00:00 EDT 2016}
}
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Works referenced in this record:
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Works referencing / citing this record:
Effect of interfacial SiO2−y layer and defect in HfO2−x film on flat-band voltage of HfO2−x/SiO2−y stacks for backside-illuminated CMOS image sensors
journal, February 2018
- Na, Heedo; Lee, Jimin; Jeong, Juyoung
- Applied Physics A, Vol. 124, Issue 3