Model-based optimization of near-field binary-pixelated beam shapers
Abstract
The optimization of components that rely on spatially dithered distributions of transparent or opaque pixels and an imaging system with far-field filtering for transmission control is demonstrated. The binary-pixel distribution can be iteratively optimized to lower an error function that takes into account the design transmission and the characteristics of the required far-field filter. Simulations using a design transmission chosen in the context of high-energy lasers show that the beam-fluence modulation at an image plane can be reduced by a factor of 2, leading to performance similar to using a non-optimized spatial-dithering algorithm with pixels of size reduced by a factor of 2 without the additional fabrication complexity or cost. The optimization process preserves the pixel distribution statistical properties. Analysis shows that the optimized pixel distribution starting from a high-noise distribution defined by a random-draw algorithm should be more resilient to fabrication errors than the optimized pixel distributions starting from a low-noise, error-diffusion algorithm, while leading to similar beamshaping performance. Furthermore, this is confirmed by experimental results obtained with various pixel distributions and induced fabrication errors.
- Authors:
-
- Univ. of Rochester, Rochester, NY (United States). Lab. for Laser Energetics
- Publication Date:
- Research Org.:
- Univ. of Rochester, NY (United States). Lab. for Laser Energetics
- Sponsoring Org.:
- USDOE National Nuclear Security Administration (NNSA)
- Contributing Org.:
- Laboratory for Laser Energetics, University of Rochester, Rochester, NY
- OSTI Identifier:
- 1347588
- Alternate Identifier(s):
- OSTI ID: 1339784
- Report Number(s):
- 2016-2015; 1325
Journal ID: ISSN 0003-6935; APOPAI; 2016-205; 1325; 2280
- Grant/Contract Number:
- NA0001944
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Applied Optics
- Additional Journal Information:
- Journal Volume: 56; Journal Issue: 4; Journal ID: ISSN 0003-6935
- Publisher:
- Optical Society of America (OSA)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 43 PARTICLE ACCELERATORS; laser beam shaping; halftone image reproduction; apodization
Citation Formats
Dorrer, C., and Hassett, J. Model-based optimization of near-field binary-pixelated beam shapers. United States: N. p., 2017.
Web. doi:10.1364/AO.56.000806.
Dorrer, C., & Hassett, J. Model-based optimization of near-field binary-pixelated beam shapers. United States. https://doi.org/10.1364/AO.56.000806
Dorrer, C., and Hassett, J. Mon .
"Model-based optimization of near-field binary-pixelated beam shapers". United States. https://doi.org/10.1364/AO.56.000806. https://www.osti.gov/servlets/purl/1347588.
@article{osti_1347588,
title = {Model-based optimization of near-field binary-pixelated beam shapers},
author = {Dorrer, C. and Hassett, J.},
abstractNote = {The optimization of components that rely on spatially dithered distributions of transparent or opaque pixels and an imaging system with far-field filtering for transmission control is demonstrated. The binary-pixel distribution can be iteratively optimized to lower an error function that takes into account the design transmission and the characteristics of the required far-field filter. Simulations using a design transmission chosen in the context of high-energy lasers show that the beam-fluence modulation at an image plane can be reduced by a factor of 2, leading to performance similar to using a non-optimized spatial-dithering algorithm with pixels of size reduced by a factor of 2 without the additional fabrication complexity or cost. The optimization process preserves the pixel distribution statistical properties. Analysis shows that the optimized pixel distribution starting from a high-noise distribution defined by a random-draw algorithm should be more resilient to fabrication errors than the optimized pixel distributions starting from a low-noise, error-diffusion algorithm, while leading to similar beamshaping performance. Furthermore, this is confirmed by experimental results obtained with various pixel distributions and induced fabrication errors.},
doi = {10.1364/AO.56.000806},
journal = {Applied Optics},
number = 4,
volume = 56,
place = {United States},
year = {Mon Jan 23 00:00:00 EST 2017},
month = {Mon Jan 23 00:00:00 EST 2017}
}
Web of Science
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