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Title: High Mobility and Electrostatics in GeSn Quantum Wells With SiGeSn Barriers

Journal Article · · Advanced Electronic Materials
ORCiD logo [1];  [2];  [1];  [3];  [3];  [4];  [4];  [5]
  1. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
  2. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States). Center for Integrated Nanotechnologies; Univ. of New Mexico, Albuquerque, NM (United States)
  3. Dartmouth College, Hanover, NH (United States)
  4. Univ. of Arkansas, Fayetteville, AR (United States)
  5. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States). Center for Integrated Nanotechnologies

GeSn is an emerging material with potential applications in next‐generation integrated optoelectronics and quantum information processing. While GeSn/SiGeSn quantum wells exhibit promising optical properties, their electrical transport characteristics and governing electrostatics in gated structures remain unexplored. Heterostructure field‐effect transistors are fabricated using GeSn/SiGeSn quantum wells and electronic transport properties of 2D holes are characterized. At 2 K, heterostructure field‐effect transistors with well/barrier compositions of Ge0.945Sn0.055/Si0.03Ge0.93Sn0.04 and Ge0.9Sn0.1/Si0.017Ge0.927Sn0.056, show peak mobilities of 9000 and 19 000 cm2/Vs, respectively, the latter setting a record for the highest mobility reported for GeSn quantum wells with a Sn concentration around 6 % or greater. Remarkably, at low carrier densities, devices with a SiGeSn barrier exhibit mobilities several times higher than previously reported for GeSn quantum wells with a Ge barrier. This higher mobility contrasts with the expectation that alloy scattering from the barrier would reduce carrier mobility. Two mechanisms based on atom probe tomography data analyses are proposed: i) unintentionally improved SiGeSn/GeSn interface and/or ii) reduced alloy scattering from short‐range order. Significant current–voltage hysteresis is observed, with the effective threshold gate voltage shifting by more than 5 V, attributed to non‐equilibrium trapped charge at various interfaces within the SiGeSn heterostructure.

Research Organization:
Energy Frontier Research Centers (EFRC) (United States). Center for Manipulation of Atomic Ordering for Manufacturing Semiconductors (µ-Atoms); Univ. of Arkansas, Fayetteville, AR (United States)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA); USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
NA0003525; SC0023412
OSTI ID:
2998782
Journal Information:
Advanced Electronic Materials, Journal Name: Advanced Electronic Materials; ISSN 2199-160X
Publisher:
WileyCopyright Statement
Country of Publication:
United States
Language:
English

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