Title: Thermal Atomic Layer Etching of MoS ₂ Using MoF ₆ and H ₂ O

Abstract

Two-dimensional (2D) layered materials offer unique properties that make them attractive for continued scaling in electronic and optoelectronic device applications. Successful integration of 2D materials into semiconductor manufacturing requires high-volume and high-precision processes for deposition and etching. Several promising large-scale deposition approaches have been reported for a range of 2D materials, but fewer studies have reported removal processes. Thermal atomic layer etching (ALE) is a scalable processing technique that offers precise control over isotropic material removal. In this work, we report a thermal ALE process for molybdenum disulfide (MoS₂). We show that MoF₆ can be used as a fluorination source, which, when combined with alternating exposures of H₂O, etches both amorphous and crystalline MoS₂ films deposited by atomic layer deposition. To characterize the ALE process and understand the etching reaction mechanism, in situ quartz crystal microbalance (QCM), Fourier transform infrared (FTIR), and quadrupole mass spectrometry (QMS) experiments were performed. From temperature-dependent in situ QCM experiments, the mass change per cycle was -5.7 ng/cm² at 150 °C and reached -270.6 ng/cm² at 300 °C, nearly 50x greater. The temperature dependence followed Arrhenius behavior with an activation energy of 13 +/- 1 kcal/mol. At 200 °C, QCM revealed a mass gain followingmore » exposure to MoF₆ and a net mass loss after exposure to H₂O. FTIR revealed the consumption of Mo-O species and formation of Mo-F and MoF_x=O species following exposures of MoF₆ and the reverse behavior following H₂O exposures. QMS measurements, combined with thermodynamic calculations, supported the removal of Mo and S through the formation of volatile MoF₂O₂ and H₂S byproducts. The proposed etching mechanism involves a two-stage oxidation of Mo through the ALE half-reactions. Etch rates of 0.5 Å/cycle for amorphous films and 0.2 Å/cycle for annealed films were measured by ex situ ellipsometry, X-ray reflectivity, and transmission electron microscopy. Precisely etching amorphous films and subsequently annealing them yielded crystalline, few-layer MoS₂ thin films. This thermal MoS₂ ALE process provides a new mechanism for fluorination-based ALE and offers a low-temperature approach for integrating amorphous and crystalline 2D MoS₂ films into high-volume device manufacturing with tight thermal budgets.« less

Authors:

Soares, Jake  ^[1];

• Search DOE PAGES for author "Soares, Jake"
• Search DOE PAGES for ORCID "0000-0002-8578-3643"

Mane, Anil U. ^[2]; Choudhury, Devika ^[2]; Letourneau, Steven  ^[2];

• Search DOE PAGES for author "Letourneau, Steven"
• Search DOE PAGES for ORCID "0000-0002-0007-6940"

Hues, Steven M. ^[1]; Elam, Jeffrey W.  ^[2];

• Search DOE PAGES for author "Elam, Jeffrey W."
• Search DOE PAGES for ORCID "0000-0002-5861-2996"

Graugnard, Elton  ^[3]

• Search DOE PAGES for author "Graugnard, Elton"
• Search DOE PAGES for ORCID "0000-0002-0497-9821"

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+ Show Author Affiliations

1. Micron School of Material Science and Engineering, Boise State University, 1910 University Dr., Boise, Idaho83725, United States
2. Applied Materials Division, Argonne National Laboratory, 9700 S Cass Avenue, Lemont, Illinois60439, United States
3. Micron School of Material Science and Engineering, Boise State University, 1910 University Dr., Boise, Idaho83725, United States, Center for Advanced Energy Studies, Idaho Falls, Idaho83401, United States

Publication Date:

Thu Jan 12 00:00:00 EST 2023

Research Org.:

Argonne National Laboratory (ANL), Argonne, IL (United States); Energy Frontier Research Centers (EFRC) (United States). Center for Electrical Energy Storage (CEES)

Sponsoring Org.:

USDOE Office of Science (SC), Basic Energy Sciences (BES); National Science Foundation (NSF)

OSTI Identifier:

1908893

Alternate Identifier(s):

OSTI ID: 2007759

Grant/Contract Number:  

AC02-06CH11357; 1751268

Resource Type:

Published Article

Journal Name:

Chemistry of Materials

Additional Journal Information:

Journal Name: Chemistry of Materials Journal Volume: 35 Journal Issue: 3; Journal ID: ISSN 0897-4756

Publisher:

American Chemical Society

Country of Publication:

United States

Language:

English

Subject:

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; atomic layer deposition; deposition; etching; layers; metal organic frameworks