High hydrogen coverage on graphene via low temperature plasma with applied magnetic field
Abstract
The chemical functionalization of two-dimensional materials is an effective method for tailoring their chemical and electronic properties with encouraging applications in energy, catalysis, and electronics. One exemplary 2D material with remarkable properties, graphene, can be exploited for hydrogen storage and large on/off ratio devices by hydrogen termination. In this work, we describe a promising plasma-based method to provide high hydrogen coverage on graphene. A low pressure (~10 mtorr) discharge generates a fine-tunable low-temperature hydrogen-rich plasma in the applied radial electric and axial magnetic fields. Post-run characterization of these samples using Raman spectroscopy and X-ray photoelectron spectroscopy demonstrates a higher hydrogen coverage, 35.8%, than the previously reported results using plasmas. Plasma measurements indicate that with the applied magnetic field, the density of hydrogen atoms can be more than 10 times larger than the density without the magnetic field. With the applied electric field directed away from the graphene substrate, the flux of plasma ions towards this substrate and the ion energy are insufficient to cause measurable damage to the treated 2D material. As a result, the low damage allows a relatively long treatment time of the graphene samples that contributes to the high coverage obtained in these experiments.
- Authors:
-
[1];
[1]
- Princeton Univ., NJ (United States)
- Princeton Plasma Physics Lab. (PPPL), Princeton, NJ (United States)
- Publication Date:
- Research Org.:
- Princeton Plasma Physics Lab. (PPPL), Princeton, NJ (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Fusion Energy Sciences (FES)
- Contributing Org.:
- Air Force Office of Scientific Research; National Science Foundation (NSF)-MRSEC program
- OSTI Identifier:
- 1818979
- Alternate Identifier(s):
- OSTI ID: 1781925
- Grant/Contract Number:
- AC02-09CH11466; SC0007968
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Carbon
- Additional Journal Information:
- Journal Volume: 177; Journal ID: ISSN 0008-6223
- Publisher:
- Elsevier
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 70 PLASMA PHYSICS AND FUSION TECHNOLOGY; Graphene; Cross-field discharge; Hydrogen coverage; Low-temperature; Magnetic field; X-ray photoelectron spectroscopy
Citation Formats
Zhao, Fang, Raitses, Yevgeny, Yang, Xiaofang, Tan, Andi, and Tully, Christopher G. High hydrogen coverage on graphene via low temperature plasma with applied magnetic field. United States: N. p., 2021.
Web. doi:10.1016/j.carbon.2021.02.084.
Zhao, Fang, Raitses, Yevgeny, Yang, Xiaofang, Tan, Andi, & Tully, Christopher G. High hydrogen coverage on graphene via low temperature plasma with applied magnetic field. United States. https://doi.org/10.1016/j.carbon.2021.02.084
Zhao, Fang, Raitses, Yevgeny, Yang, Xiaofang, Tan, Andi, and Tully, Christopher G. Thu .
"High hydrogen coverage on graphene via low temperature plasma with applied magnetic field". United States. https://doi.org/10.1016/j.carbon.2021.02.084. https://www.osti.gov/servlets/purl/1818979.
@article{osti_1818979,
title = {High hydrogen coverage on graphene via low temperature plasma with applied magnetic field},
author = {Zhao, Fang and Raitses, Yevgeny and Yang, Xiaofang and Tan, Andi and Tully, Christopher G.},
abstractNote = {The chemical functionalization of two-dimensional materials is an effective method for tailoring their chemical and electronic properties with encouraging applications in energy, catalysis, and electronics. One exemplary 2D material with remarkable properties, graphene, can be exploited for hydrogen storage and large on/off ratio devices by hydrogen termination. In this work, we describe a promising plasma-based method to provide high hydrogen coverage on graphene. A low pressure (~10 mtorr) discharge generates a fine-tunable low-temperature hydrogen-rich plasma in the applied radial electric and axial magnetic fields. Post-run characterization of these samples using Raman spectroscopy and X-ray photoelectron spectroscopy demonstrates a higher hydrogen coverage, 35.8%, than the previously reported results using plasmas. Plasma measurements indicate that with the applied magnetic field, the density of hydrogen atoms can be more than 10 times larger than the density without the magnetic field. With the applied electric field directed away from the graphene substrate, the flux of plasma ions towards this substrate and the ion energy are insufficient to cause measurable damage to the treated 2D material. As a result, the low damage allows a relatively long treatment time of the graphene samples that contributes to the high coverage obtained in these experiments.},
doi = {10.1016/j.carbon.2021.02.084},
journal = {Carbon},
number = ,
volume = 177,
place = {United States},
year = {Thu Feb 25 00:00:00 EST 2021},
month = {Thu Feb 25 00:00:00 EST 2021}
}
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