DOE PAGES title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Ferroelectricity in Si-Doped Hafnia: Probing Challenges in Absence of Screening Charges

Abstract

The ability to develop ferroelectric materials using binary oxides is critical to enable novel low-power, high-density non-volatile memory and fast switching logic. The discovery of ferroelectricity in hafnia-based thin films, has focused the hopes of the community on this class of materials to overcome the existing problems of perovskite-based integrated ferroelectrics. However, both the control of ferroelectricity in doped-HfO2 and the direct characterization at the nanoscale of ferroelectric phenomena, are increasingly difficult to achieve. The main limitations are imposed by the inherent intertwining of ferroelectric and dielectric properties, the role of strain, interfaces and electric field-mediated phase, and polarization changes. In this work, using Si-doped HfO2 as a material system, we performed a correlative study with four scanning probe techniques for the local sensing of intrinsic ferroelectricity on the oxide surface. Putting each technique in perspective, we demonstrated that different origins of spatially resolved contrast can be obtained, thus highlighting possible crosstalk not originated by a genuine ferroelectric response. By leveraging the strength of each method, we showed how intrinsic processes in ultrathin dielectrics, i.e., electronic leakage, existence and generation of energy states, charge trapping (de-trapping) phenomena, and electrochemical effects, can influence the sensed response. We then proceeded to initiatemore » hysteresis loops by means of tip-induced spectroscopic cycling (i.e., “wake-up”), thus observing the onset of oxide degradation processes associated with this step. Finally, direct piezoelectric effects were studied using the high pressure resulting from the probe’s confinement, noticing the absence of a net time-invariant piezo-generated charge. Our results are critical in providing a general framework of interpretation for multiple nanoscale processes impacting ferroelectricity in doped-hafnia and strategies for sensing it.« less

Authors:
ORCiD logo [1];  [2]; ORCiD logo [1]; ORCiD logo [3]; ORCiD logo [3];  [1];  [1];  [1];  [1];  [1];  [1];  [1];  [1]; ORCiD logo [3];  [4];  [1]
  1. Interuniversity Microelectronics Centre (IMEC), Leuven (Belgium)
  2. Institut de Ciència de Materials de Barcelona, ICMAB-CSIC, Bellaterra, Spain
  3. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
  4. Interuniversity Microelectronics Centre (IMEC), Leuven (Belgium); Katholieke Univ. Leuven, Heverlee (Belgium)
Publication Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
OSTI Identifier:
1648869
Grant/Contract Number:  
AC05-00OR22725
Resource Type:
Accepted Manuscript
Journal Name:
Nanomaterials
Additional Journal Information:
Journal Volume: 10; Journal Issue: 8; Journal ID: ISSN 2079-4991
Publisher:
MDPI
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Celano, Umberto, Gomez, Andres, Piedimonte, Paola, Neumayer, Sabine M., Collins, Liam, Popovici, Mihaela, Florent, Karine, McMitchell, Sean, Favia, Paola, Drijbooms, Chris, Bender, Hugo, Paredis, Kristof, di Piazza, Luca, Jesse, Stephen, Van Houdt, Jan, and van der Heide, Paul. Ferroelectricity in Si-Doped Hafnia: Probing Challenges in Absence of Screening Charges. United States: N. p., 2020. Web. doi:10.3390/nano10081576.
Celano, Umberto, Gomez, Andres, Piedimonte, Paola, Neumayer, Sabine M., Collins, Liam, Popovici, Mihaela, Florent, Karine, McMitchell, Sean, Favia, Paola, Drijbooms, Chris, Bender, Hugo, Paredis, Kristof, di Piazza, Luca, Jesse, Stephen, Van Houdt, Jan, & van der Heide, Paul. Ferroelectricity in Si-Doped Hafnia: Probing Challenges in Absence of Screening Charges. United States. https://doi.org/10.3390/nano10081576
Celano, Umberto, Gomez, Andres, Piedimonte, Paola, Neumayer, Sabine M., Collins, Liam, Popovici, Mihaela, Florent, Karine, McMitchell, Sean, Favia, Paola, Drijbooms, Chris, Bender, Hugo, Paredis, Kristof, di Piazza, Luca, Jesse, Stephen, Van Houdt, Jan, and van der Heide, Paul. Tue . "Ferroelectricity in Si-Doped Hafnia: Probing Challenges in Absence of Screening Charges". United States. https://doi.org/10.3390/nano10081576. https://www.osti.gov/servlets/purl/1648869.
@article{osti_1648869,
title = {Ferroelectricity in Si-Doped Hafnia: Probing Challenges in Absence of Screening Charges},
author = {Celano, Umberto and Gomez, Andres and Piedimonte, Paola and Neumayer, Sabine M. and Collins, Liam and Popovici, Mihaela and Florent, Karine and McMitchell, Sean and Favia, Paola and Drijbooms, Chris and Bender, Hugo and Paredis, Kristof and di Piazza, Luca and Jesse, Stephen and Van Houdt, Jan and van der Heide, Paul},
abstractNote = {The ability to develop ferroelectric materials using binary oxides is critical to enable novel low-power, high-density non-volatile memory and fast switching logic. The discovery of ferroelectricity in hafnia-based thin films, has focused the hopes of the community on this class of materials to overcome the existing problems of perovskite-based integrated ferroelectrics. However, both the control of ferroelectricity in doped-HfO2 and the direct characterization at the nanoscale of ferroelectric phenomena, are increasingly difficult to achieve. The main limitations are imposed by the inherent intertwining of ferroelectric and dielectric properties, the role of strain, interfaces and electric field-mediated phase, and polarization changes. In this work, using Si-doped HfO2 as a material system, we performed a correlative study with four scanning probe techniques for the local sensing of intrinsic ferroelectricity on the oxide surface. Putting each technique in perspective, we demonstrated that different origins of spatially resolved contrast can be obtained, thus highlighting possible crosstalk not originated by a genuine ferroelectric response. By leveraging the strength of each method, we showed how intrinsic processes in ultrathin dielectrics, i.e., electronic leakage, existence and generation of energy states, charge trapping (de-trapping) phenomena, and electrochemical effects, can influence the sensed response. We then proceeded to initiate hysteresis loops by means of tip-induced spectroscopic cycling (i.e., “wake-up”), thus observing the onset of oxide degradation processes associated with this step. Finally, direct piezoelectric effects were studied using the high pressure resulting from the probe’s confinement, noticing the absence of a net time-invariant piezo-generated charge. Our results are critical in providing a general framework of interpretation for multiple nanoscale processes impacting ferroelectricity in doped-hafnia and strategies for sensing it.},
doi = {10.3390/nano10081576},
journal = {Nanomaterials},
number = 8,
volume = 10,
place = {United States},
year = {Tue Aug 11 00:00:00 EDT 2020},
month = {Tue Aug 11 00:00:00 EDT 2020}
}

Works referenced in this record:

Imaging mechanism of piezoresponse force microscopy in capacitor structures
journal, April 2008

  • Kalinin, Sergei V.; Rodriguez, Brian J.; Kim, Seung-Hyun
  • Applied Physics Letters, Vol. 92, Issue 15
  • DOI: 10.1063/1.2905266

Exploring Local Electrostatic Effects with Scanning Probe Microscopy: Implications for Piezoresponse Force Microscopy and Triboelectricity
journal, October 2014

  • Balke, Nina; Maksymovych, Petro; Jesse, Stephen
  • ACS Nano, Vol. 8, Issue 10
  • DOI: 10.1021/nn505176a

Switching Kinetics in Nanoscale Hafnium Oxide Based Ferroelectric Field-Effect Transistors
journal, January 2017

  • Mulaosmanovic, Halid; Ocker, Johannes; Müller, Stefan
  • ACS Applied Materials & Interfaces, Vol. 9, Issue 4
  • DOI: 10.1021/acsami.6b13866

Differentiating Ferroelectric and Nonferroelectric Electromechanical Effects with Scanning Probe Microscopy
journal, May 2015


Nanoionics-based resistive switching memories
journal, November 2007

  • Waser, Rainer; Aono, Masakazu
  • Nature Materials, Vol. 6, Issue 11, p. 833-840
  • DOI: 10.1038/nmat2023

Evidence for oxygen vacancies movement during wake-up in ferroelectric hafnium oxide
journal, January 2016

  • Starschich, S.; Menzel, S.; Böttger, U.
  • Applied Physics Letters, Vol. 108, Issue 3
  • DOI: 10.1063/1.4940370

The band excitation method in scanning probe microscopy for rapid mapping of energy dissipation on the nanoscale
journal, September 2007


Phase transitions in ferroelectric silicon doped hafnium oxide
journal, September 2011

  • Böscke, T. S.; Teichert, St.; Bräuhaus, D.
  • Applied Physics Letters, Vol. 99, Issue 11
  • DOI: 10.1063/1.3636434

On the structural origins of ferroelectricity in HfO 2 thin films
journal, April 2015

  • Sang, Xiahan; Grimley, Everett D.; Schenk, Tony
  • Applied Physics Letters, Vol. 106, Issue 16
  • DOI: 10.1063/1.4919135

Band excitation in scanning probe microscopy: sines of change
journal, November 2011


Impact of charge trapping on the ferroelectric switching behavior of doped HfO 2 : Trapping influence on the ferroelectric switching
journal, October 2015

  • Pešić, Milan; Slesazeck, Stefan; Schenk, Tony
  • physica status solidi (a), Vol. 213, Issue 2
  • DOI: 10.1002/pssa.201532379

Insights into Nanoscale Electrochemical Reduction in a Memristive Oxide: the Role of Three-Phase Boundaries
journal, April 2014

  • Lenser, Christian; Patt, Marten; Menzel, Stephan
  • Advanced Functional Materials, Vol. 24, Issue 28
  • DOI: 10.1002/adfm.201304233

Origin of Ferroelectricity in Epitaxial Si-Doped HfO 2 Films
journal, January 2019

  • Li, Tao; Ye, Mao; Sun, Zhenzhong
  • ACS Applied Materials & Interfaces, Vol. 11, Issue 4
  • DOI: 10.1021/acsami.8b19558

Ferroelectricity in Hf 0.5 Zr 0.5 O 2 Thin Films: A Microscopic Study of the Polarization Switching Phenomenon and Field-Induced Phase Transformations
journal, February 2018

  • Chouprik, Anastasia; Zakharchenko, Sergey; Spiridonov, Maxim
  • ACS Applied Materials & Interfaces, Vol. 10, Issue 10
  • DOI: 10.1021/acsami.7b17482

New insights in the relation between electron trap generation and the statistical properties of oxide breakdown
journal, April 1998

  • Degraeve, R.; Groeseneken, G.; Bellens, R.
  • IEEE Transactions on Electron Devices, Vol. 45, Issue 4
  • DOI: 10.1109/16.662800

A Complete Statistical Investigation of RTN in HfO2-Based RRAM in High Resistive State
journal, August 2015

  • Puglisi, Francesco Maria; Larcher, Luca; Padovani, Andrea
  • IEEE Transactions on Electron Devices, Vol. 62, Issue 8
  • DOI: 10.1109/TED.2015.2439812

Charge trapping properties in TiO[sub 2]∕HfSiO∕SiO[sub 2] gate stacks probed by scanning capacitance microscopy
journal, January 2008

  • Naitou, Y.; Arimura, H.; Kitano, N.
  • Applied Physics Letters, Vol. 92, Issue 1
  • DOI: 10.1063/1.2828863

Ferroelectricity in undoped hafnium oxide
journal, June 2015

  • Polakowski, Patrick; Müller, Johannes
  • Applied Physics Letters, Vol. 106, Issue 23
  • DOI: 10.1063/1.4922272

Local Polarization Switching in Piezoresponse Force Microscopy
journal, August 2007

  • Morozovska, Anna N.; Kalinin, Sergei V.; Eliseev, Eugene A.
  • Ferroelectrics, Vol. 354, Issue 1
  • DOI: 10.1080/00150190701454966

Impact of film properties of atomic layer deposited HfO2 resulting from annealing with a TiN capping layer
journal, September 2006

  • Triyoso, D. H.; Tobin, P. J.; White, B. E.
  • Applied Physics Letters, Vol. 89, Issue 13
  • DOI: 10.1063/1.2357032

A rhombohedral ferroelectric phase in epitaxially strained Hf0.5Zr0.5O2 thin films
journal, October 2018


Effect of Polycrystallinity and Presence of Dielectric Phases on NC-FinFET Variability
conference, December 2018

  • Lin, Yen-Kai; Kao, Ming-Yen; Agarwal, Harshit
  • 2018 IEEE International Electron Devices Meeting (IEDM)
  • DOI: 10.1109/IEDM.2018.8614704

Ab initio modeling of oxygen-vacancy formation in doped-HfO x RRAM: Effects of oxide phases, stoichiometry, and dopant concentrations
journal, July 2015

  • Zhao, Liang; Clima, Sergiu; Magyari-Köpe, Blanka
  • Applied Physics Letters, Vol. 107, Issue 1
  • DOI: 10.1063/1.4926337

Ferroelectric phenomena in Si-doped HfO 2 thin films with TiN and Ir electrodes
journal, May 2014

  • Lomenzo, Patrick D.; Zhao, Peng; Takmeel, Qanit
  • Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 32, Issue 3
  • DOI: 10.1116/1.4873323

Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: a comparison of model and experiment
journal, January 2017

  • Park, Min Hyuk; Lee, Young Hwan; Kim, Han Joon
  • Nanoscale, Vol. 9, Issue 28
  • DOI: 10.1039/C7NR02121F

Structural Changes Underlying Field-Cycling Phenomena in Ferroelectric HfO 2 Thin Films
journal, July 2016

  • Grimley, Everett D.; Schenk, Tony; Sang, Xiahan
  • Advanced Electronic Materials, Vol. 2, Issue 9
  • DOI: 10.1002/aelm.201600173

First demonstration of vertically stacked ferroelectric Al doped HfO2 devices for NAND applications
conference, June 2017


Engineering of Ferroelectric HfO 2 –ZrO 2 Nanolaminates
journal, April 2017

  • Weeks, Stephen L.; Pal, Ashish; Narasimhan, Vijay K.
  • ACS Applied Materials & Interfaces, Vol. 9, Issue 15
  • DOI: 10.1021/acsami.7b00776

Ferroelectricity and Antiferroelectricity of Doped Thin HfO 2 -Based Films
journal, February 2015

  • Park, Min Hyuk; Lee, Young Hwan; Kim, Han Joon
  • Advanced Materials, Vol. 27, Issue 11
  • DOI: 10.1002/adma.201404531

A FeFET based super-low-power ultra-fast embedded NVM technology for 22nm FDSOI and beyond
conference, December 2017

  • Dunkel, S.; Trentzsch, M.; Richter, R.
  • 2017 IEEE International Electron Devices Meeting (IEDM)
  • DOI: 10.1109/IEDM.2017.8268425

Direct and converse piezoelectric responses at the nanoscale from epitaxial BiFeO 3 thin films grown by polymer assisted deposition
journal, January 2018

  • Vila-Fungueiriño, José Manuel; Gómez, Andrés; Antoja-Lleonart, Jordi
  • Nanoscale, Vol. 10, Issue 43
  • DOI: 10.1039/C8NR05737K

The flexoelectric effect in Al-doped hafnium oxide
journal, January 2018

  • Celano, Umberto; Popovici, Mihaela; Florent, Karine
  • Nanoscale, Vol. 10, Issue 18
  • DOI: 10.1039/C8NR00618K

Ferroelectricity in hafnium oxide thin films
journal, September 2011

  • Böscke, T. S.; Müller, J.; Bräuhaus, D.
  • Applied Physics Letters, Vol. 99, Issue 10
  • DOI: 10.1063/1.3634052

A comprehensive study on the structural evolution of HfO 2 thin films doped with various dopants
journal, January 2017

  • Park, M. H.; Schenk, T.; Fancher, C. M.
  • Journal of Materials Chemistry C, Vol. 5, Issue 19
  • DOI: 10.1039/C7TC01200D

Growth of epitaxial orthorhombic YO 1.5 -substituted HfO 2 thin film
journal, July 2015

  • Shimizu, Takao; Katayama, Kiliha; Kiguchi, Takanori
  • Applied Physics Letters, Vol. 107, Issue 3
  • DOI: 10.1063/1.4927450

Ferroelectric or non-ferroelectric: Why so many materials exhibit “ferroelectricity” on the nanoscale
journal, June 2017

  • Vasudevan, Rama K.; Balke, Nina; Maksymovych, Peter
  • Applied Physics Reviews, Vol. 4, Issue 2
  • DOI: 10.1063/1.4979015

Ferroelectricity in HfO2 enables nonvolatile data storage in 28 nm HKMG
conference, June 2012

  • Muller, J.; Yurchuk, E.; Schlosser, T.
  • 2012 IEEE Symposium on VLSI Technology, 2012 Symposium on VLSI Technology (VLSIT)
  • DOI: 10.1109/VLSIT.2012.6242443

Vertical Ferroelectric HfO2 FET based on 3-D NAND Architecture: Towards Dense Low-Power Memory
conference, December 2018

  • Florent, K.; Pesic, M.; Subirats, A.
  • 2018 IEEE International Electron Devices Meeting (IEDM)
  • DOI: 10.1109/IEDM.2018.8614710

Ferroelectricity in Simple Binary ZrO 2 and HfO 2
journal, July 2012

  • Müller, Johannes; Böscke, Tim S.; Schröder, Uwe
  • Nano Letters, Vol. 12, Issue 8
  • DOI: 10.1021/nl302049k

Piezo-generated charge mapping revealed through direct piezoelectric force microscopy
journal, October 2017


Quantitative Electromechanical Atomic Force Microscopy
journal, July 2019


Possible electrochemical origin of ferroelectricity in HfO2 thin films
journal, July 2020