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Title: (Invited) Measurement of the Energy-Band Relations of Stabilized Si Photoanodes Using Operando Ambient Pressure X-ray Photoelectron Spectroscopy

Abstract

The energy-band relations and electronic properties for the light absorber/protection-layer stack of TiO2-stabilized Si photoanodes have been confirmed by ambient pressure x-ray synchrotron radiation photoelectron spectroscopy under an applied potential (operando), from single core-level emission lines. The experiments have further been complemented with laboratory-based monochromatic XPS data. Electrochemical parameters are additionally derived directly from x-ray photoemission data, and a method is presented to derive interface-state densities from such operando data.

Authors:
 [1];  [1];  [1];  [2];  [3];  [4];  [5];  [5];  [4];  [6];  [1];  [7];  [1]
  1. California Institute of Technology (CalTech), Pasadena, CA (United States). Joint Center for Artificial Photosynthesis (JCAP)
  2. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS)
  3. Technical Univ. of Darmstadt (Germany)
  4. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
  5. California Institute of Technology (CalTech), Pasadena, CA (United States). Joint Center for Artificial Photosynthesis (JCAP); Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS)
  6. California Institute of Technology (CalTech), Pasadena, CA (United States)
  7. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States); Shanghai Inst. of Microsystem (China)
Publication Date:
Research Org.:
California Institute of Technology (CalTech), Pasadena, CA (United States); Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
OSTI Identifier:
1634096
Grant/Contract Number:  
SC0004993; AC02-05CH11231
Resource Type:
Accepted Manuscript
Journal Name:
ECS Transactions (Online)
Additional Journal Information:
Journal Name: ECS Transactions (Online); Journal Volume: 66; Journal Issue: 6; Journal ID: ISSN 1938-6737
Publisher:
Electrochemical Society
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY

Citation Formats

Richter, M. H., Lichterman, M. F., Hu, S., Crumlin, E. J., Mayer, T., Axnanda, S., Favaro, M., Drisdell, W., Hussain, Z., Brunschwig, B., Lewis, Nathan S., Liu, Z., and Lewerenz, H. J. (Invited) Measurement of the Energy-Band Relations of Stabilized Si Photoanodes Using Operando Ambient Pressure X-ray Photoelectron Spectroscopy. United States: N. p., 2015. Web. doi:10.1149/06606.0105ecst.
Richter, M. H., Lichterman, M. F., Hu, S., Crumlin, E. J., Mayer, T., Axnanda, S., Favaro, M., Drisdell, W., Hussain, Z., Brunschwig, B., Lewis, Nathan S., Liu, Z., & Lewerenz, H. J. (Invited) Measurement of the Energy-Band Relations of Stabilized Si Photoanodes Using Operando Ambient Pressure X-ray Photoelectron Spectroscopy. United States. https://doi.org/10.1149/06606.0105ecst
Richter, M. H., Lichterman, M. F., Hu, S., Crumlin, E. J., Mayer, T., Axnanda, S., Favaro, M., Drisdell, W., Hussain, Z., Brunschwig, B., Lewis, Nathan S., Liu, Z., and Lewerenz, H. J. Mon . "(Invited) Measurement of the Energy-Band Relations of Stabilized Si Photoanodes Using Operando Ambient Pressure X-ray Photoelectron Spectroscopy". United States. https://doi.org/10.1149/06606.0105ecst. https://www.osti.gov/servlets/purl/1634096.
@article{osti_1634096,
title = {(Invited) Measurement of the Energy-Band Relations of Stabilized Si Photoanodes Using Operando Ambient Pressure X-ray Photoelectron Spectroscopy},
author = {Richter, M. H. and Lichterman, M. F. and Hu, S. and Crumlin, E. J. and Mayer, T. and Axnanda, S. and Favaro, M. and Drisdell, W. and Hussain, Z. and Brunschwig, B. and Lewis, Nathan S. and Liu, Z. and Lewerenz, H. J.},
abstractNote = {The energy-band relations and electronic properties for the light absorber/protection-layer stack of TiO2-stabilized Si photoanodes have been confirmed by ambient pressure x-ray synchrotron radiation photoelectron spectroscopy under an applied potential (operando), from single core-level emission lines. The experiments have further been complemented with laboratory-based monochromatic XPS data. Electrochemical parameters are additionally derived directly from x-ray photoemission data, and a method is presented to derive interface-state densities from such operando data.},
doi = {10.1149/06606.0105ecst},
journal = {ECS Transactions (Online)},
number = 6,
volume = 66,
place = {United States},
year = {Mon Apr 13 00:00:00 EDT 2015},
month = {Mon Apr 13 00:00:00 EDT 2015}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record

Figures / Tables:

Figure 1 Figure 1: Model of the light-absorber/protection-layer/catalyst stack used in this investigation, consisting of a silicon substrate (e.g. n-doped Si bulk), the Si space-charge region (Si-SCR), the SiO2 interface region, a TiO2 protection layer, and an electrolyte layer for in-situ investigation. The expected potential distribution, U(x), is depicted for each layer.more » An applied potential will drop partially in the silicon space-charge region, in the SiO2, in the TiO2 at the interface with the electrolyte, and in the electrolyte double layer. For a highly doped silicon substrate, the potential drop will appear almost exclusively at the TiO2/electrolyte interface. The thickness of the electrolyte, TiO2, and SiO2 layer is specified for both ex-situ (hν = 1489.6 eV) and in-situ (hν = 4000 eV) experiments.« less

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