Linear control of the oxidation level on graphene oxide sheets using the cyclic atomic layer reduction technique
Abstract
Precise control of oxidation level on graphene oxide (GO) sheets is still a big challenge. This work demonstrates a linear control of surface oxidation level on GO sheets via atomic layer reduction (ALR) technique at 100 and 150°C. The oxygen stripping rate during the ALR cycling was assessed at different operating temperatures; 0.055 %/cycle (150°C) and 0.028 %/cycle (100°C). It was shown that the optical band gap as well as the electrical conductivity can be linearly tuned with ALR cycle number for the graphene-like materials. This unique capability was not feasible via utilizing conventional synthesis routes (e.g. thermal or chemical reduction) since these techniques only provide a stepwise control over the oxidation/reduction processes. The in-situ oxidation level on GO materials can be accurately controlled through the ALR/atomic layer oxidation (ALO) cycle. Accordingly, the ALR/ALO cycle offers excellent reversibility for adjusting the chemical composition of graphene-like materials, and tuning the optical and electronic properties of such nanomaterials.
- Authors:
-
[1];
[2];
[3]
- Yuan Ze Univ., Taoyuan (Taiwan)
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Univ. of Tennessee, Knoxville, TN (United States); Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)
- Publication Date:
- Research Org.:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1509525
- Grant/Contract Number:
- AC05-00OR22725
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Nanoscale
- Additional Journal Information:
- Journal Volume: 11; Journal Issue: 16; Journal ID: ISSN 2040-3364
- Publisher:
- Royal Society of Chemistry
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING
Citation Formats
Mallick, Bikash Chandra, Hsieh, Chien-Te, Yin, Ken-Ming, Li, Jianlin, and Ashraf Gandomi, Yasser. Linear control of the oxidation level on graphene oxide sheets using the cyclic atomic layer reduction technique. United States: N. p., 2019.
Web. doi:10.1039/c8nr10118c.
Mallick, Bikash Chandra, Hsieh, Chien-Te, Yin, Ken-Ming, Li, Jianlin, & Ashraf Gandomi, Yasser. Linear control of the oxidation level on graphene oxide sheets using the cyclic atomic layer reduction technique. United States. https://doi.org/10.1039/c8nr10118c
Mallick, Bikash Chandra, Hsieh, Chien-Te, Yin, Ken-Ming, Li, Jianlin, and Ashraf Gandomi, Yasser. Thu .
"Linear control of the oxidation level on graphene oxide sheets using the cyclic atomic layer reduction technique". United States. https://doi.org/10.1039/c8nr10118c. https://www.osti.gov/servlets/purl/1509525.
@article{osti_1509525,
title = {Linear control of the oxidation level on graphene oxide sheets using the cyclic atomic layer reduction technique},
author = {Mallick, Bikash Chandra and Hsieh, Chien-Te and Yin, Ken-Ming and Li, Jianlin and Ashraf Gandomi, Yasser},
abstractNote = {Precise control of oxidation level on graphene oxide (GO) sheets is still a big challenge. This work demonstrates a linear control of surface oxidation level on GO sheets via atomic layer reduction (ALR) technique at 100 and 150°C. The oxygen stripping rate during the ALR cycling was assessed at different operating temperatures; 0.055 %/cycle (150°C) and 0.028 %/cycle (100°C). It was shown that the optical band gap as well as the electrical conductivity can be linearly tuned with ALR cycle number for the graphene-like materials. This unique capability was not feasible via utilizing conventional synthesis routes (e.g. thermal or chemical reduction) since these techniques only provide a stepwise control over the oxidation/reduction processes. The in-situ oxidation level on GO materials can be accurately controlled through the ALR/atomic layer oxidation (ALO) cycle. Accordingly, the ALR/ALO cycle offers excellent reversibility for adjusting the chemical composition of graphene-like materials, and tuning the optical and electronic properties of such nanomaterials.},
doi = {10.1039/c8nr10118c},
journal = {Nanoscale},
number = 16,
volume = 11,
place = {United States},
year = {Thu Mar 21 00:00:00 EDT 2019},
month = {Thu Mar 21 00:00:00 EDT 2019}
}
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